Inventor · disambiguated record
Hoshang Subawalla
Also filed as: SUBAWALLA HOSHANG
5 granted patents·6 pending applications·58 citations·filing 2002–2007
80Inventor score
Top patents by PatentIndex Score
11 records- 0190US7581549B2Method for removing carbon-containing residues from a substrateAIR PROD & CHEM·Filed 2005·Granted Sep 1, 2009·18 cites·20 claims
- 0277US7267727B2Processing of semiconductor components with dense processing fluids and ultrasonic energyAIR PROD & CHEM·Filed 2003·Granted Sep 11, 2007·21 cites·13 claims
- 0376US7195676B2Method for removal of flux and other residue in dense fluid systemsAIR PROD & CHEM·Filed 2004·Granted Mar 27, 2007·12 cites·8 claims
- 0460US7211553B2Processing of substrates with dense fluids comprising acetylenic diols and/or alcoholsAIR PROD & CHEM·Filed 2003·Granted May 1, 2007·3 cites·14 claims
- 0560US7074378B2Process for the purification of NF3AIR PROD & CHEM·Filed 2004·Granted Jul 11, 2006·4 cites·20 claims
- 0656US2007137675A1Method for removal of flux and other residue in dense fluid systemsMCDERMOTT WAYNE T·Filed 2007·Application pending·0 cites
- 0745US2005029492A1Processing of semiconductor substrates with dense fluids comprising acetylenic diols and/or alcoholsFiled 2003·Application pending·0 cites
- 0845US2008004194A1Processing of semiconductor components with dense processing fluidsAIR PROD & CHEM·Filed 2007·Application pending·0 cites
- 0945US2008000505A1Processing of semiconductor components with dense processing fluidsAIR PROD & CHEM·Filed 2007·Application pending·0 cites
- 1037US2004055621A1Processing of semiconductor components with dense processing fluids and ultrasonic energyAIR PROD & CHEM·Filed 2002·Application pending·0 cites
- 1136US2006081273A1Dense fluid compositions and processes using same for article treatment and residue removalMCDERMOTT WAYNE T·Filed 2004·Application pending·0 cites
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