Inventor · disambiguated record
Nobuyuki Ikezawa
Also filed as: IKEZAWA NOBUYUKI
1 granted patent·2 pending applications·8 citations·filing 2001–2004
31Inventor score
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3 records- 0155US6531349B2Method of etching polycrystalline silicon film by using two consecutive dry-etching processesNEC CORP·Filed 2001·Granted Mar 11, 2003·8 cites·3 claims
- 0229US2001036732A1Method of manufacturing semiconductor device having minute gate electrodesNEC CORP·Filed 2001·Application pending·0 cites
- 0321US2004157385A1Method for manufacturing a semiconductor device by using a dry etching techniqueNEC ELECTRONICS CORP·Filed 2004·Application pending·0 cites
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