Inventor · disambiguated record
Hyung-Rae Lee
Also filed as: LEE HYUNG-RAE
8 granted patents·5 pending applications·16 citations·filing 2005–2015
77Inventor score
Top patents by PatentIndex Score
13 records- 0180US8198194B2Methods of forming p-channel field effect transistors having SiGe source/drain regionsYANG JONG HO·Filed 2010·Granted Jun 12, 2012·8 cites·11 claims
- 0278US8623739B2Method of manufacturing semiconductor device using acid diffusionLEE HYUNG-RAE·Filed 2011·Granted Jan 7, 2014·7 cites·5 claims
- 0358US8350235B2Semiconductor intra-field dose correctionFREESCALE SEMICONDUCTOR INC·Filed 2009·Granted Jan 8, 2013·1 cites·15 claims
- 0445US8219938B2Semiconductor inter-field dose correctionLEE HYUNG-RAE·Filed 2009·Granted Jul 10, 2012·0 cites·20 claims
- 0544US9337032B2Method of forming pattern of semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted May 10, 2016·0 cites·19 claims
- 0644US8987118B2Method of fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Mar 24, 2015·0 cites·16 claims
- 0742US9412604B2Methods of manufacturing semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Aug 9, 2016·0 cites·10 claims
- 0841US2006127816A1Double photolithography methods with reduced intermixing of solventsSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
- 0937US9613821B2Method of forming patterns and method of manufacturing integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Apr 4, 2017·0 cites·65 claims
- 1037US2006160028A1Method of forming fine patterns of a semiconductor deviceLEE HYUNG-RAE·Filed 2006·Application pending·0 cites
- 1137US2006115747A1Photo mask structure used during twice-performed photo process and methods of using the sameLEE HYUNG-RAE·Filed 2005·Application pending·0 cites
- 1236US2013040448A1Methods of forming metal or metal nitride patterns and methods of manufacturing semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2012·Application pending·0 cites
- 1331US2015241771A1Photoresist compositions and methods of forming patterns using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2015·Application pending·0 cites
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