Inventor · disambiguated record
Shuichi Irumata
Also filed as: IRUMATA SHUICHI
10 granted patents·2 pending applications·72 citations·filing 2002–2016
88Inventor score
Files withNIPPON MINING CO6OKABE TAKEO3IRUMATA SHUICHI1JX NIPPON MINING & METALS CORP1NIKKO MATERIALS CO LTD1
Top patents by PatentIndex Score
12 records- 0184US10844475B2Method for manufacturing sputtering targetJX NIPPON MINING & METALS CORP·Filed 2016·Granted Nov 24, 2020·3 cites·9 claims
- 0283US7674446B2Hafnium silicide target for forming gate oxide film, and method for preparation thereofNIPPON MINING CO·Filed 2009·Granted Mar 9, 2010·7 cites·15 claims
- 0377US6986834B2Hafnium silicide target and manufacturing method for preparation thereofNIKKO MATERIALS CO LTD·Filed 2003·Granted Jan 17, 2006·22 cites·9 claims
- 0476US7241368B2Hafnium silicide target for gate oxide film formation and its production methodNIPPON MINING CO·Filed 2002·Granted Jul 10, 2007·20 cites·10 claims
- 0575US8262816B2Hafnium alloy targetOKABE TAKEO·Filed 2008·Granted Sep 11, 2012·3 cites·2 claims
- 0675US8241438B2Hafnium alloy targetOKABE TAKEO·Filed 2008·Granted Aug 14, 2012·3 cites·2 claims
- 0775US8062440B2Hafnium alloy target and process for producing the sameOKABE TAKEO·Filed 2008·Granted Nov 22, 2011·3 cites·5 claims
- 0862US7459036B2Hafnium alloy target and process for producing the sameNIPPON MINING CO·Filed 2004·Granted Dec 2, 2008·5 cites·2 claims
- 0961US7517515B2Hafnium silicide target for forming gate oxide film and method for preparation thereofNIPPON MINING CO·Filed 2002·Granted Apr 14, 2009·6 cites·17 claims
- 1048US2007209547A1Barrier Film For Flexible Copper Substrate And Sputtering Target For Forming Barrier FilmNIPPON MINING CO·Filed 2005·Application pending·0 cites
- 1146US8318314B2Barrier film for flexible copper substrate and sputtering target for forming barrier filmIRUMATA SHUICHI·Filed 2009·Granted Nov 27, 2012·0 cites·9 claims
- 1243US2010013096A1Cu-Mn Alloy Sputtering Target and Semiconductor WiringNIPPON MINING CO·Filed 2007·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →