Inventor · disambiguated record
Mayuka Osaki
Also filed as: OSAKI MAYUKA
10 granted patents·7 pending applications·14 citations·filing 2009–2025
82Inventor score
Top patents by PatentIndex Score
17 records- 0186US10186399B2Scanning electron microscopeHITACHI HIGH TECH CORP·Filed 2017·Granted Jan 22, 2019·4 cites·10 claims
- 0280US11211226B2Pattern cross-sectional shape estimation system and programHITACHI HIGH TECH CORP·Filed 2020·Granted Dec 28, 2021·1 cites·5 claims
- 0378US11545336B2Scanning electron microscopy system and pattern depth measurement methodHITACHI HIGH TECH CORP·Filed 2019·Granted Jan 3, 2023·2 cites·5 claims
- 0477US11302513B2Electron microscope apparatus, inspection system using electron microscope apparatus, and inspection method using electron microscope apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Apr 12, 2022·1 cites·8 claims
- 0575US8671366B2Estimating shape based on comparison between actual waveform and library in lithography processTANAKA MAKI·Filed 2010·Granted Mar 11, 2014·4 cites·4 claims
- 0668US9488815B2Pattern evaluation method and pattern evaluation deviceHITACHI HIGH TECH CORP·Filed 2013·Granted Nov 8, 2016·2 cites·16 claims
- 0766US2024212973A1Processor System Capable of Communicating with Multicharged Particle Beam Device and Method ThereofHITACHI HIGH TECH CORP·Filed 2023·Application pending·0 cites
- 0861US2024222064A1Processor System, Correction Method, and Correction ProgramHITACHI HIGH TECH CORP·Filed 2023·Application pending·0 cites
- 0960US2025306474A1Semiconductor Pattern Evaluation Method, Semiconductor Manufacturing Process Management System, and Semiconductor Pattern Evaluation SystemHITACHI HIGH TECH CORP·Filed 2025·Application pending·0 cites
- 1058US12500061B2Observation system, observation method, and programHITACHI HIGH TECH CORP·Filed 2023·Granted Dec 16, 2025·0 cites·15 claims
- 1155US12142457B2Charged particle beam deviceHITACHI HIGH TECH CORP·Filed 2020·Granted Nov 12, 2024·0 cites·15 claims
- 1253US2023230886A1Processor system, semiconductor inspection system, and programHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 1348US2011268363A1Method for evaluating superimposition of patternOSAKI MAYUKA·Filed 2009·Application pending·0 cites
- 1447US11164720B2Scanning electron microscope and calculation method for three-dimensional structure depthHITACHI HIGH TECH CORP·Filed 2020·Granted Nov 2, 2021·0 cites·15 claims
- 1542US2015235804A1Charged Particle Microscope System and Measurement Method Using SameHITACHI HIGH TECH CORP·Filed 2013·Application pending·0 cites
- 1641US11355304B2Electronic microscope deviceHITACHI HIGH TECH CORP·Filed 2018·Granted Jun 7, 2022·0 cites·15 claims
- 1736US2012126116A1Pattern shape selection method and pattern measuring deviceTANAKA MAKI·Filed 2010·Application pending·0 cites
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