Inventor · disambiguated record
Alexander S. Gybin
Also filed as: GYBIN ALEXANDER S · GYBIN ALEXANDER SERGEIEVICH
11 granted patents·3 pending applications·148 citations·filing 1991–2011
91Inventor score
Top patents by PatentIndex Score
14 records- 0183US7074358B2Polymer casting method and apparatusGYBIN ALEXANDER SERGEIEVICH·Filed 2001·Granted Jul 11, 2006·29 cites·17 claims
- 0277US5506089APhotosensitive resin compositionCHROMALINE CORP·Filed 1994·Granted Apr 9, 1996·30 cites·7 claims
- 0369US9044986B2Digital mold texturizing methods, materials, and substratesKOMATSU TOSHIFUMI·Filed 2011·Granted Jun 2, 2015·1 cites·10 claims
- 0468US8097176B2Digital mold texturizing methods, materials, and substratesKOMATSU TOSHIFUMI·Filed 2007·Granted Jan 17, 2012·1 cites·13 claims
- 0562US5334485AAcid soluble photo-resist comprising a photosensitive polymerCHROMALINE CORP·Filed 1991·Granted Aug 2, 1994·19 cites·30 claims
- 0659US6140006AIntegral membrane layer formed from a photosensitive layer in an imageable photoresist laminateCHROMALINE CORP·Filed 1998·Granted Oct 31, 2000·22 cites·28 claims
- 0758US5645975AScreen printing stencil composition with improved water resistanceCHROMALINE CORP·Filed 1995·Granted Jul 8, 1997·12 cites·13 claims
- 0851US5654032ANon-photosensitive aqueous blockout composition and blockout method for repairing flawsCHROMALINE CORP·Filed 1995·Granted Aug 5, 1997·11 cites·9 claims
- 0950US6248498B1Photosensitive resin compositionCHROMALINE CORP·Filed 1999·Granted Jun 19, 2001·15 cites·18 claims
- 1045US2005082254A1Product and method for protecting metal during etchingFiled 2004·Application pending·0 cites
- 1141US6020436APhotosensitive resin compositionCHROMALINE CORP·Filed 1993·Granted Feb 1, 2000·6 cites·16 claims
- 1232US2004200805A1Metal engraving method, article, and apparatusFiled 2003·Application pending·0 cites
- 1331US6503683B1Screen printing stencil composition with improved water resistanceCHROMALINE CORP·Filed 1995·Granted Jan 7, 2003·2 cites·14 claims
- 1425US2002192569A1Devices and methods for exposure of photoreactive compositions with light emitting diodesCHROMALINE CORP·Filed 2001·Application pending·0 cites
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