Inventor · disambiguated record
Heine Melle Mulder
Also filed as: MULDER HEINE M · MULDER HEINE MELLE
35 granted patents·11 pending applications·364 citations·filing 2002–2022
96Inventor score
Files withASML NETHERLANDS BV32MULDER HEINE MELLE6HANSEN STEVEN GEORGE2ASML HOLDING NV1BASELMANS JOHANNES JACOBUS MATHEUS1
Top patents by PatentIndex Score
46 records- 0196US6737662B2Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program productASML NETHERLANDS BV·Filed 2002·Granted May 18, 2004·109 cites·23 claims
- 0294US7525642B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Apr 28, 2009·32 cites·21 claims
- 0393US6958806B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Oct 25, 2005·67 cites·19 claims
- 0491US7038763B2Kit of parts for assembling an optical element, method of assembling an optical element, optical element, lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted May 2, 2006·65 cites·20 claims
- 0585US9116439B2Illumination system and lithographic apparatusMULDER HEINE MELLE·Filed 2011·Granted Aug 25, 2015·4 cites·20 claims
- 0685US7030958B2Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Apr 18, 2006·31 cites·47 claims
- 0780US8089672B2Array element device control method and apparatusTINNEMANS PATRICIUS ALOYSIUS JACOBUS·Filed 2008·Granted Jan 3, 2012·6 cites·29 claims
- 0875US7525641B2System and method for uniformity correctionASML HOLDING NV·Filed 2005·Granted Apr 28, 2009·6 cites·11 claims
- 0974US8896815B2Lithographic apparatus and device manufacturing methodMULDER HEINE MELLE·Filed 2012·Granted Nov 25, 2014·2 cites·20 claims
- 1074US8052289B2Mirror array for lithographyASML NETHERLANDS BV·Filed 2006·Granted Nov 8, 2011·4 cites·14 claims
- 1172US10295916B2EUV source chamber and gas flow regime for lithographic apparatus, multi-layer mirror and lithographic apparatusASML NETHERLANDS BV·Filed 2018·Granted May 21, 2019·2 cites·20 claims
- 1272US8937706B2Lithographic apparatus and methodMULDER HEINE MELLE·Filed 2007·Granted Jan 20, 2015·3 cites·24 claims
- 1372US7924406B2Stage apparatus, lithographic apparatus and device manufacturing method having switch device for two illumination channelsASML NETHERLANDS BV·Filed 2006·Granted Apr 12, 2011·3 cites·36 claims
- 1469US6862076B2Method of determining stray radiation lithographic projection apparatusASML NETHERLANDS BV·Filed 2003·Granted Mar 1, 2005·13 cites·11 claims
- 1568US8885144B2Illumination system and lithographic apparatusCLAESSENS BERT JAN·Filed 2011·Granted Nov 11, 2014·2 cites·20 claims
- 1665US8610878B2Lithographic apparatus and methodBASELMANS JOHANNES JACOBUS MATHEUS·Filed 2010·Granted Dec 17, 2013·2 cites·20 claims
- 1764US8587766B2Lithographic apparatus and device manufacturing methodMULDER HEINE MELLE·Filed 2009·Granted Nov 19, 2013·1 cites·21 claims
- 1862US8194231B2Lithographic apparatus and methodMULDER HEINE MELLE·Filed 2008·Granted Jun 5, 2012·2 cites·24 claims
- 1962US7671968B2Lithographic apparatus having masking parts and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Mar 2, 2010·1 cites·24 claims
- 2062US7397535B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Jul 8, 2008·1 cites·21 claims
- 2161US10222703B2Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2017·Granted Mar 5, 2019·0 cites·20 claims
- 2259US8576377B2Lithographic apparatus and device manufacturing methodHANSEN STEVEN GEORGE·Filed 2007·Granted Nov 5, 2013·1 cites·29 claims
- 2357US9778575B2Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2016·Granted Oct 3, 2017·0 cites·22 claims
- 2457US7508487B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted Mar 24, 2009·5 cites·55 claims
- 2556US8059266B2Radiometric Kirk testHULT DAVID A·Filed 2008·Granted Nov 15, 2011·1 cites·29 claims
- 2653US9651875B2Illumination system and lithographic apparatusASML NETHERLANDS BV·Filed 2015·Granted May 16, 2017·0 cites·21 claims
- 2753US9250536B2Lithographic apparatus and methodMULDER HEINE MELLE·Filed 2008·Granted Feb 2, 2016·0 cites·23 claims
- 2853US2015034788A1Rotatable Frame For a Lithographic ApparatusASML NETHERLANDS BV·Filed 2013·Application pending·0 cites
- 2950US2016349628A1Rotatable frame, lithographic apparatus, projection system, method for focusing radiation and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Application pending·0 cites
- 3049US10394143B2Topography measurement systemASML NETHERLANDS BV·Filed 2016·Granted Aug 27, 2019·0 cites·20 claims
- 3148US9823576B2Radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Nov 21, 2017·0 cites·21 claims
- 3248US2010020300A1Measurement apparatus and methodASML NETHERLANDS BV·Filed 2009·Application pending·0 cites
- 3347US7312850B2Lithographic apparatus, illumination system, and optical element for rotating an intensity distributionASML NETHERLANDS BV·Filed 2004·Granted Dec 25, 2007·1 cites·18 claims
- 3444US7903234B2Lithographic apparatus, device manufacturing method and computer program productASML NETHERLANDS BV·Filed 2007·Granted Mar 8, 2011·0 cites·14 claims
- 3544US2008100816A1Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 3644US2015124231A1Assembly For Modifying Properties Of A Plurality Of Radiation Beams, A Lithography Apparatus, A Method Of Modifying Properties Of A Plurality Of Radiation Beams And A Device Manufacturing MethodASML NETHERLANDS BV·Filed 2013·Application pending·0 cites
- 3743US9715183B2Device, lithographic apparatus, method for guiding radiation and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Jul 25, 2017·0 cites·20 claims
- 3841US7224440B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted May 29, 2007·0 cites·27 claims
- 3941US2007103789A1Optical system, lithographic apparatus and method for projectingASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 4040US7872731B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Jan 18, 2011·0 cites·21 claims
- 4140US2007058151A1Optical element for use in lithography apparatus and method of conditioning radiation beamZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
- 4238US9563135B2Process tuning with polarizationHANSEN STEVEN GEORGE·Filed 2011·Granted Feb 7, 2017·0 cites·19 claims
- 4338US2024275114A1A seed laser optical isolator, seed isolator module, euv radiation source, lithographic apparatus and optical isolator operating methodASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 4437US2005134820A1Method for exposing a substrate, patterning device, and lithographic apparatusASML NETHERLANDS BV·Filed 2003·Application pending·0 cites
- 4536US2013044302A1Lithographic Apparatus and MethodASML NETHERLANDS BV·Filed 2012·Application pending·0 cites
- 4636US2022350181A1Optical modulatorASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
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