Inventor · disambiguated record
Mitsutoshi Miyasaka
Also filed as: MIYASAKA MITSUTOSHI
94 granted patents·9 pending applications·3,029 citations·filing 1991–2023
99Inventor score
Top patents by PatentIndex Score
103 records- 0199US6017779AFabrication method for a thin film semiconductor device, the thin film semiconductor device itself, liquid crystal display, and electronic deviceSEIKO EPSON CORP·Filed 1998·Granted Jan 25, 2000·648 cites·42 claims
- 0298US7773069B2Method of driving an electrophoretic displaySEIKO EPSON CORP·Filed 2006·Granted Aug 10, 2010·42 cites·19 claims
- 0397US7701436B2Electrophoretic device, electronic apparatus, and method for driving the electrophoretic deviceSEIKO EPSON CORP·Filed 2005·Granted Apr 20, 2010·32 cites·17 claims
- 0497US6566683B1Laser heat treatment method, laser heat treatment apparatus, and semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2000·Granted May 20, 2003·120 cites·12 claims
- 0597US6521492B2Thin-film semiconductor device fabrication methodSEIKO EPSON CORP·Filed 2001·Granted Feb 18, 2003·147 cites·35 claims
- 0697US5858819AFabrication method for a thin film semiconductor device, the thin film semiconductor device itself, liquid crystal display, and electronic deviceSEIKO EPSON CORP·Filed 1995·Granted Jan 12, 1999·209 cites·12 claims
- 0796US11417275B2Circuit device, electro-optical element, and electronic apparatusSEIKO EPSON CORP·Filed 2021·Granted Aug 16, 2022·3 cites·15 claims
- 0896US7782292B2Electrophoretic display device and method for driving the sameSEIKO EPSON CORP·Filed 2006·Granted Aug 24, 2010·35 cites·15 claims
- 0996US6066516AMethod for forming crystalline semiconductor layers, a method for fabricating thin film transistors, and method for fabricating solar cells and active matrix liquid crystal devicesSEIKO EPSON CORP·Filed 1996·Granted May 23, 2000·165 cites·9 claims
- 1095US11699393B2Circuit device, electro-optical element, and electronic apparatusSEIKO EPSON CORP·Filed 2022·Granted Jul 11, 2023·2 cites·14 claims
- 1194US7961171B2Electrooptic device and electronic apparatusSEIKO EPSON CORP·Filed 2007·Granted Jun 14, 2011·23 cites·19 claims
- 1294US6180957B1Thin-film semiconductor device, and display system using the sameSEIKO EPSON CORP·Filed 1997·Granted Jan 30, 2001·135 cites·14 claims
- 1393US8704753B2Electrophoresis display device and a method for controlling the driving electrophoresis display elements of an electrophoresis display deviceMIYAZAKI ATSUSHI·Filed 2007·Granted Apr 22, 2014·15 cites·20 claims
- 1493US7755599B2Electrophoretic display device and driving method thereofSEIKO EPSON CORP·Filed 2006·Granted Jul 13, 2010·12 cites·13 claims
- 1593US7208961B2Electrostatic capacitance detection deviceSEIKO EPSON CORP·Filed 2005·Granted Apr 24, 2007·26 cites·12 claims
- 1693US6124154AFabrication process for thin film transistors in a display or electronic deviceSEIKO EPSON CORP·Filed 1996·Granted Sep 26, 2000·140 cites·58 claims
- 1792US6602765B2Fabrication method of thin-film semiconductor deviceSEIKO EPSON CORP·Filed 2001·Granted Aug 5, 2003·63 cites·36 claims
- 1892US6407012B1Method of producing silicon oxide film, method of manufacturing semiconductor device, semiconductor device, display and infrared irradiating deviceSEIKO EPSON CORP·Filed 1998·Granted Jun 18, 2002·101 cites·26 claims
- 1991US8576163B2Electrophoretic display device, method of driving the same, and electronic apparatusMIYAZAKI ATSUSHI·Filed 2008·Granted Nov 5, 2013·11 cites·4 claims
- 2091US6632749B2Method for manufacturing silicon oxide film, method for manufacturing semiconductor device, semiconductor device, display device and infrared light irradiating deviceSEIKO EPSON CORP·Filed 2002·Granted Oct 14, 2003·45 cites·30 claims
- 2190US11468827B2Circuit device, electro-optical element, and electronic apparatusSEIKO EPSON CORP·Filed 2021·Granted Oct 11, 2022·2 cites·17 claims
- 2290US10254356B2Magnetic field measurement method and magnetic field measurement apparatusSEIKO EPSON CORP·Filed 2015·Granted Apr 9, 2019·4 cites·3 claims
- 2390US6573161B1Thin film semiconductor device fabrication processSEIKO EPSON CORP·Filed 2000·Granted Jun 3, 2003·50 cites·36 claims
- 2490US6444507B1Fabrication process for thin film transistors in a display or electronic deviceSEIKO EPSON CORP·Filed 2000·Granted Sep 3, 2002·48 cites·12 claims
- 2589US10024931B2Magnetic field measurement method and magnetic field measurement apparatusSEIKO EPSON CORP·Filed 2015·Granted Jul 17, 2018·4 cites·11 claims
- 2689US7835553B2Identity authentication device and fingerprint sensorSEIKO EPSON CORP·Filed 2005·Granted Nov 16, 2010·29 cites·15 claims
- 2789US6455360B1Method for forming crystalline semiconductor layers, a method for fabricating thin film transistors, and a method for fabricating solar cells and active matrix liquid crystal devicesSEIKO EPSON CORP·Filed 1999·Granted Sep 24, 2002·72 cites·20 claims
- 2889US5372958AProcess for fabricating a thin film semiconductor deviceSEIKO EPSON CORP·Filed 1991·Granted Dec 13, 1994·89 cites·2 claims
- 2988US10748487B2Electro-optical device and electronic apparatusSEIKO EPSON CORP·Filed 2018·Granted Aug 18, 2020·3 cites·26 claims
- 3087US10497312B2Electro-optical device and electronic apparatusSEIKO EPSON CORP·Filed 2018·Granted Dec 3, 2019·3 cites·11 claims
- 3187US6391690B2Thin film semiconductor device and method for producing the sameSEIKO EPSON CORP·Filed 1996·Granted May 21, 2002·76 cites·9 claims
- 3286US7755711B2Liquid crystal device and electronic apparatusSEIKO EPSON CORP·Filed 2007·Granted Jul 13, 2010·10 cites·15 claims
- 3385US6673126B2Multiple chamber fabrication equipment for thin film transistors in a display or electronic deviceSEIKO EPSON CORP·Filed 2002·Granted Jan 6, 2004·30 cites·7 claims
- 3484US10755641B2Electro-optical device and electronic apparatusSEIKO EPSON CORP·Filed 2018·Granted Aug 25, 2020·2 cites·24 claims
- 3584US8085241B2Method of driving an electrophoretic displayMIYASAKA MITSUTOSHI·Filed 2010·Granted Dec 27, 2011·4 cites·16 claims
- 3684US6884699B1Process and unit for production of polycrystalline silicon filmSEIKO EPSON CORP·Filed 2000·Granted Apr 26, 2005·32 cites·12 claims
- 3784US6808965B1Methodology for fabricating a thin film transistor, including an LDD region, from amorphous semiconductor film deposited at 530° C. or less using low pressure chemical vapor depositionSEIKO EPSON CORP·Filed 1994·Granted Oct 26, 2004·76 cites·24 claims
- 3883US7486809B2Capacitance detection device, fingerprint sensor, biometric authentication device, and method for searching capacitance detection conditionSEIKO EPSON CORP·Filed 2005·Granted Feb 3, 2009·11 cites·18 claims
- 3983US5811323AProcess for fabricating a thin film transistorSEIKO EPSON CORP·Filed 1996·Granted Sep 22, 1998·47 cites·16 claims
- 4080US6972433B2Fabrication method for a thin film semiconductor device, the thin film semiconductor device itself, liquid crystal display, and electronic deviceSEIKO EPSON CORP·Filed 2001·Granted Dec 6, 2005·17 cites·4 claims
- 4180US6660572B2Thin film semiconductor device and method for producing the sameSEIKO EPSON CORP·Filed 2002·Granted Dec 9, 2003·20 cites·11 claims
- 4278US6335542B2Fabrication method for a thin film semiconductor device, the thin film semiconductor device itself, liquid crystal display, and electronic deviceSEIKO EPSON CORP·Filed 1999·Granted Jan 1, 2002·36 cites·12 claims
- 4377US8279244B2Method of driving an electrophoretic displayMIYASAKA MITSUTOSHI·Filed 2011·Granted Oct 2, 2012·2 cites·12 claims
- 4477US6746903B2Method for forming crystalline semiconductor layers, a method for fabricating thin film transistors, and a method for fabricating solar cells and active matrix liquid crystal devicesSEIKO EPSON CORP·Filed 2002·Granted Jun 8, 2004·15 cites·14 claims
- 4577US5510146ACVD apparatus, method of forming semiconductor film, and method of fabricating thin-film semiconductor deviceSEIKO EPSON CORP·Filed 1992·Granted Apr 23, 1996·60 cites·33 claims
- 4676US12159581B2Circuit device, electro-optical element, and electronic apparatusSEIKO EPSON CORP·Filed 2023·Granted Dec 3, 2024·0 cites·8 claims
- 4776US7327596B2Electrostatic capacitance detection device and smart cardSEIKO EPSON CORP·Filed 2005·Granted Feb 5, 2008·10 cites·7 claims
- 4874US5637512AMethod for fabricating a thin film semiconductor deviceSEIKO EPSON CORP·Filed 1995·Granted Jun 10, 1997·31 cites·3 claims
- 4973US10725127B2Magnetic field measurement method and magnetic field measurement apparatusSEIKO EPSON CORP·Filed 2019·Granted Jul 28, 2020·1 cites·1 claims
- 5072US7880203B2Semiconductor device, electro-optical device, electronic apparatus, method for manufacturing semiconductor device, method for manufacturing electro-optical device, and method for manufacturing electronic apparatusSEIKO EPSON CORP·Filed 2008·Granted Feb 1, 2011·4 cites·21 claims
Showing the top 50 of 103 patent records by PatentIndex Score.
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