Inventor · disambiguated record

David A. Ziemer

Also filed as: ZIEMER DAVID A

1 granted patent·61 citations·filing 2002–2002

50Inventor score

Technology areasG03F

Files withIBM1

Top patents by PatentIndex Score

1 record

0191US6735492B2Feedback method utilizing lithographic exposure field dimensions to predict process tool overlay settingsIBM·Filed 2002·Granted May 11, 2004·61 cites·32 claims

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