Inventor · disambiguated record
Jorge Luque
Also filed as: LUQUE JORGE
19 granted patents·5 pending applications·101 citations·filing 2002–2025
92Inventor score
Top patents by PatentIndex Score
24 records- 0196US10134569B1Method and apparatus for real-time monitoring of plasma chamber wall conditionLAM RES CORP·Filed 2017·Granted Nov 20, 2018·22 cites·21 claims
- 0288US9735069B2Method and apparatus for determining process rateLAM RES CORP·Filed 2015·Granted Aug 15, 2017·5 cites·13 claims
- 0386US7239737B2User interface for quantifying wafer non-uniformities and graphically explore significanceLAM RES CORP·Filed 2002·Granted Jul 3, 2007·36 cites·22 claims
- 0481US8060330B2Method and system for centering wafer on chuckO'NEILL ROBERT GRIFFITH·Filed 2008·Granted Nov 15, 2011·12 cites·20 claims
- 0579US9548189B2Plasma etching systems and methods using empirical mode decompositionLAM RES CORP·Filed 2015·Granted Jan 17, 2017·2 cites·11 claims
- 0675US2025298392A1Large spot spectral sensing to control spatial setpointsLAM RES CORP·Filed 2025·Application pending·0 cites
- 0774US9640371B2System and method for detecting a process point in multi-mode pulse processesLAM RES CORP·Filed 2014·Granted May 2, 2017·2 cites·17 claims
- 0873US8206996B2Etch tool process indicator method and apparatusKANARIK KEREN JACOBS·Filed 2009·Granted Jun 26, 2012·2 cites·17 claims
- 0971US12360510B2Large spot spectral sensing to control spatial setpointsLAM RES CORP·Filed 2022·Granted Jul 15, 2025·0 cites·30 claims
- 1071US10242849B2System and method for detecting a process point in multi-mode pulse processesLAM RES CORP·Filed 2017·Granted Mar 26, 2019·1 cites·18 claims
- 1169US7738693B2User interface for wafer data analysis and visualizationLAM RES CORP·Filed 2003·Granted Jun 15, 2010·11 cites·44 claims
- 1266US8492174B2Etch tool process indicator method and apparatusKANARIK KEREN JACOBS·Filed 2012·Granted Jul 23, 2013·1 cites·16 claims
- 1366US2023420281A1Reflectometer to monitor substrate movementLAM RES CORP·Filed 2023·Application pending·0 cites
- 1459US7018855B2Process controls for improved wafer uniformity using integrated or standalone metrologyLAM RES CORP·Filed 2003·Granted Mar 28, 2006·7 cites·34 claims
- 1558US2024255858A1In situ sensor and logic for process controlLAM RES CORP·Filed 2022·Application pending·0 cites
- 1656US10504704B2Plasma etching systems and methods using empirical mode decompositionLAM RES CORP·Filed 2016·Granted Dec 10, 2019·0 cites·15 claims
- 1754US2024395519A1Metrology Enclosure Including Spectral Reflectometry System for Plasma Processing System Using Direct-Drive Radiofrequency Power SupplyLAM RES CORP·Filed 2022·Application pending·0 cites
- 1853US11791189B2Reflectometer to monitor substrate movementLAM RES CORP·Filed 2018·Granted Oct 17, 2023·0 cites·29 claims
- 1952US9543225B2Systems and methods for detecting endpoint for through-silicon via reveal applicationsLAM RES CORP·Filed 2014·Granted Jan 10, 2017·0 cites·17 claims
- 2051US11056322B2Method and apparatus for determining process rateLAM RES CORP·Filed 2017·Granted Jul 6, 2021·0 cites·9 claims
- 2149US9941178B2Methods for detecting endpoint for through-silicon via reveal applicationsLAM RES CORP·Filed 2016·Granted Apr 10, 2018·0 cites·16 claims
- 2247US7945085B2User interface for wafer data analysis and visualizationLAM RES CORP·Filed 2010·Granted May 17, 2011·0 cites·12 claims
- 2346US2024096713A1Machine-learning in multi-step semiconductor fabrication processesLAM RES CORP·Filed 2021·Application pending·0 cites
- 2444US10224187B1Detecting partial unclamping of a substrate from an ESC of a substrate processing systemLAM RES CORP·Filed 2018·Granted Mar 5, 2019·0 cites·20 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →