Inventor · disambiguated record
Jong Kyoung Park
Also filed as: PARK JONG-KYOUNG
9 granted patents·37 citations·filing 2007–2022
82Inventor score
Top patents by PatentIndex Score
9 records- 0196US9865540B2Vertical memory devices and methods of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Jan 9, 2018·26 cites·19 claims
- 0282US9853048B2Memory device and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Dec 26, 2017·5 cites·16 claims
- 0377US8026042B2Polymer for organic anti-reflective coating layer and composition including the sameDONGJIN SEMICHEM CO LTD·Filed 2010·Granted Sep 27, 2011·2 cites·2 claims
- 0468US7829650B2Polymer for organic anti-reflective coating layer and composition including the sameDONGJIN SEMICHEM CO LTD·Filed 2007·Granted Nov 9, 2010·1 cites·1 claims
- 0567US7629110B2Monomer for forming organic anti-reflective coating layer, polymer thereof and composition including the sameDONGJIN SEMICHEM CO LTD·Filed 2007·Granted Dec 8, 2009·2 cites·10 claims
- 0658US8551684B2Polymer for forming resist protection film, composition for forming resist protection film, and method of forming patterns of semiconductor devices using the compositionPARK JONG KYOUNG·Filed 2011·Granted Oct 8, 2013·1 cites·12 claims
- 0753US12046464B2Substrate cleaning composition, method for cleaning substrate using the same, and method for fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Jul 23, 2024·0 cites·20 claims
- 0841US9423692B2Composition for forming resist protection film for lithography and method for forming pattern of semiconductor device using the sameDONGJIN SEMICHEM CO LTD·Filed 2015·Granted Aug 23, 2016·0 cites·13 claims
- 0938US8859194B2Polymer compound, and resist-protecting film composition including same for a liquid immersion exposure processHAN MAN HO·Filed 2013·Granted Oct 14, 2014·0 cites·21 claims
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