Inventor · disambiguated record
Wen-Jye Chung
Also filed as: CHUNG WEN-JYE
11 granted patents·1 pending application·255 citations·filing 1995–2001
91Inventor score
Files withTAIWAN SEMICONDUCTOR MFG11
Top patents by PatentIndex Score
12 records- 0181US5633505ASemiconductor wafer incorporating marks for inspecting first layer overlay shift in global alignment processTAIWAN SEMICONDUCTOR MFG·Filed 1996·Granted May 27, 1997·64 cites·2 claims
- 0276US6143621ACapacitor circuit structure for determining overlay errorTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted Nov 7, 2000·44 cites·11 claims
- 0374US6242757B1Capacitor circuit structure for determining overlay errorTAIWAN SEMICONDUCTOR MFG·Filed 2000·Granted Jun 5, 2001·15 cites·9 claims
- 0470US5985764ALayer independent alignment systemTAIWAN SEMICONDUCTOR MFG·Filed 1997·Granted Nov 16, 1999·34 cites·17 claims
- 0570US5843831AProcess independent alignment systemTAIWAN SEMICONDUCTOR MFG·Filed 1997·Granted Dec 1, 1998·41 cites·17 claims
- 0658US6248169B1Dual-cup coating apparatusTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted Jun 19, 2001·25 cites·15 claims
- 0753US5545570AMethod of inspecting first layer overlay shift in global alignment processTAIWAN SEMICONDUCTOR MFG·Filed 1995·Granted Aug 13, 1996·18 cites·2 claims
- 0842US6219171B1Apparatus and method for stepper exposure control in photographyTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted Apr 17, 2001·8 cites·22 claims
- 0936US5756964AThermal processing apparatusTAIWAN SEMICONDUCTOR MFG·Filed 1997·Granted May 26, 1998·6 cites·8 claims
- 1034US2001033975A1Yield of dies by adding dummy pattern on open area of multi-project maskFiled 2001·Application pending·0 cites
- 1129US5747817AOne-step method for on-line lithographic pattern inspectionTAIWAN SEMICONDUCTOR MFG·Filed 1996·Granted May 5, 1998·0 cites·8 claims
- 1229US5733691AOne-step method for on-line lithographic pattern inspectionTAIWAN SEMICONDUCTOR MFG·Filed 1997·Granted Mar 31, 1998·0 cites·14 claims
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