Inventor · disambiguated record
Richard Johannes Franciscus Van Haren
Also filed as: VAN HAREN RICHARD JOHANNES FRA · VAN HAREN RICHARD JOHANNES FRANCISCUS
91 granted patents·12 pending applications·526 citations·filing 2002–2025
99Inventor score
Files withASML NETHERLANDS BV85VAN HAREN RICHARD JOHANNES FRANCISCUS6MUSA SAMI2SEWELL HARRY2VAN DER SCHAAR MAURITS2
Top patents by PatentIndex Score
103 records- 0198US11204239B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2020·Granted Dec 21, 2021·7 cites·36 claims
- 0298US7486408B2Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurementASML NETHERLANDS BV·Filed 2006·Granted Feb 3, 2009·53 cites·11 claims
- 0397US11940740B2Methods and apparatus for obtaining diagnostic information relating to an industrial processASML NETHERLANDS BV·Filed 2022·Granted Mar 26, 2024·2 cites·20 claims
- 0497US11428521B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2021·Granted Aug 30, 2022·3 cites·29 claims
- 0597US10718604B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2019·Granted Jul 21, 2020·6 cites·22 claims
- 0697US10642162B2Methods and apparatus for obtaining diagnostic information relating to an industrial processASML NETHERLANDS BV·Filed 2019·Granted May 5, 2020·8 cites·23 claims
- 0797US9946165B2Methods and apparatus for obtaining diagnostic information relating to an industrial processASML NETHERLANDS BV·Filed 2014·Granted Apr 17, 2018·19 cites·20 claims
- 0896US10274834B2Methods and apparatus for obtaining diagnostic information relating to an industrial processASML NETHERLANDS BV·Filed 2018·Granted Apr 30, 2019·15 cites·20 claims
- 0996US7880880B2Alignment systems and methods for lithographic systemsASML NETHERLANDS BV·Filed 2005·Granted Feb 1, 2011·24 cites·15 claims
- 1096US7112813B2Device inspection method and apparatus using an asymmetric markerASML NETHERLANDS BV·Filed 2003·Granted Sep 26, 2006·61 cites·64 claims
- 1195US7329888B2Alignment systems and methods for lithographic systemsASML NETHERLANDS BV·Filed 2005·Granted Feb 12, 2008·18 cites·28 claims
- 1294US10386176B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2015·Granted Aug 20, 2019·5 cites·20 claims
- 1393US10474045B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Nov 12, 2019·6 cites·20 claims
- 1493US10331043B2Optimization of target arrangement and associated targetASML NETHERLANDS BV·Filed 2015·Granted Jun 25, 2019·6 cites·20 claims
- 1593US7297971B2Alignment systems and methods for lithographic systemsASML NETHERLANDS BV·Filed 2005·Granted Nov 20, 2007·12 cites·3 claims
- 1692US9291916B2Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methodsASML NETHERLANDS BV·Filed 2015·Granted Mar 22, 2016·5 cites·12 claims
- 1792US8976355B2Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methodsVAN DER SANDEN STEFAN CORNELIS THEODORUS·Filed 2012·Granted Mar 10, 2015·19 cites·8 claims
- 1892US8139217B2Alignment systems and methods for lithographic systemsVAN BILSEN FRANCISCUS BERNARDUS MARIA·Filed 2010·Granted Mar 20, 2012·12 cites·18 claims
- 1992US8115938B2Method of providing alignment marks, device manufacturing method and lithographic apparatusVAN HAREN RICHARD JOHANNES FRANCISCUS·Filed 2009·Granted Feb 14, 2012·16 cites·23 claims
- 2092US7863763B2Binary sinusoidal sub-wavelength gratings as alignment marksASML NETHERLANDS BV·Filed 2005·Granted Jan 4, 2011·17 cites·13 claims
- 2190US7439531B2Alignment systems and methods for lithographic systemsASML NETHERLANDS BV·Filed 2006·Granted Oct 21, 2008·7 cites·32 claims
- 2290US7332732B2Alignment systems and methods for lithographic systemsASML NETHERLANDS BV·Filed 2003·Granted Feb 19, 2008·22 cites·143 claims
- 2388US7330261B2Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatusASML NETHERLANDS BV·Filed 2003·Granted Feb 12, 2008·19 cites·37 claims
- 2487US12287584B2Methods and apparatus for obtaining diagnostic information relating to an industrial processASML NETHERLANDS BV·Filed 2023·Granted Apr 29, 2025·0 cites·20 claims
- 2587US10061212B2Metrology target, method and apparatus, target design method, computer program and lithographic systemASML NETHERLANDS BV·Filed 2017·Granted Aug 28, 2018·4 cites·15 claims
- 2687US9879988B2Metrology method and apparatus, computer program and lithographic systemASML NETHERLANDS BV·Filed 2016·Granted Jan 30, 2018·4 cites·20 claims
- 2787US7460231B2Alignment tool for a lithographic apparatusASML NETHERLANDS BV·Filed 2006·Granted Dec 2, 2008·9 cites·7 claims
- 2885US11300889B2Metrology apparatusASML NETHERLANDS BV·Filed 2019·Granted Apr 12, 2022·3 cites·20 claims
- 2985US2025264813A1Methods and apparatus for obtaining diagnostic information relating to an industrial processASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 3084US7897058B2Device manufacturing method and computer program productASML NETHERLANDS BV·Filed 2006·Granted Mar 1, 2011·10 cites·21 claims
- 3184US7619738B2Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatusASML NETHERLANDS BV·Filed 2007·Granted Nov 17, 2009·4 cites·25 claims
- 3283US7462548B2Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2006·Granted Dec 9, 2008·5 cites·18 claims
- 3382US12429328B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2022·Granted Sep 30, 2025·0 cites·20 claims
- 3482US11187995B2Metrology using a plurality of metrology target measurement recipesASML NETHERLANDS BV·Filed 2017·Granted Nov 30, 2021·2 cites·20 claims
- 3582US10324379B2Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2016·Granted Jun 18, 2019·3 cites·14 claims
- 3681US10162272B2Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Dec 25, 2018·2 cites·23 claims
- 3781US10025193B2Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program productASML NETHERLANDS BV·Filed 2014·Granted Jul 17, 2018·3 cites·20 claims
- 3880US11099486B2Generating predicted data for control or monitoring of a production processASML NETHERLANDS BV·Filed 2017·Granted Aug 24, 2021·3 cites·21 claims
- 3980US11054813B2Method and apparatus for controlling an industrial process using product groupingASML NETHERLANDS BV·Filed 2016·Granted Jul 6, 2021·2 cites·20 claims
- 4079US8982347B2Alignment mark deformation estimating method, substrate position predicting method, alignment system and lithographic apparatusASML NETHERLANDS N V·Filed 2012·Granted Mar 17, 2015·8 cites·17 claims
- 4179US8072615B2Alignment method, alignment system, and product with alignment markMUSA SAMI·Filed 2008·Granted Dec 6, 2011·11 cites·15 claims
- 4279US7916276B2Lithographic apparatus and device manufacturing method with double exposure overlay controlASML NETHERLANDS BV·Filed 2010·Granted Mar 29, 2011·2 cites·20 claims
- 4378US11294294B2Alignment mark positioning in a lithographic processASML NETHERLANDS BV·Filed 2019·Granted Apr 5, 2022·2 cites·20 claims
- 4478US11226567B2Methods and apparatus for use in a device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Jan 18, 2022·2 cites·20 claims
- 4578US8625096B2Method and system for increasing alignment target contrastSEWELL HARRY·Filed 2010·Granted Jan 7, 2014·3 cites·23 claims
- 4677US12189308B2Method for adjusting a target feature in a model of a patterning process based on local electric fieldsASML NETHERLANDS BV·Filed 2023·Granted Jan 7, 2025·0 cites·20 claims
- 4776US10788761B2Determining an optimal operational parameter setting of a metrology systemASML NETHERLANDS BV·Filed 2017·Granted Sep 29, 2020·1 cites·20 claims
- 4876US6858948B2Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2002·Granted Feb 22, 2005·11 cites·22 claims
- 4975US7821650B2Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurementASML NETHERLANDS BV·Filed 2008·Granted Oct 26, 2010·3 cites·20 claims
- 5075US7687209B2Lithographic apparatus and device manufacturing method with double exposure overlay controlASML NETHERLANDS BV·Filed 2006·Granted Mar 30, 2010·3 cites·18 claims
Showing the top 50 of 103 patent records by PatentIndex Score.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →