Inventor · disambiguated record
Hiroaki Ishimura
Also filed as: ISHIMURA HIROAKI
8 granted patents·3 pending applications·45 citations·filing 2001–2013
84Inventor score
Top patents by PatentIndex Score
11 records- 0187US9099349B2Semiconductor device manufacturing methodHITACHI HIGH TECH CORP·Filed 2013·Granted Aug 4, 2015·8 cites·10 claims
- 0286US7224568B2Plasma processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2005·Granted May 29, 2007·12 cites·12 claims
- 0376US8207066B2Dry etching methodINOUE YOSHIHARU·Filed 2009·Granted Jun 26, 2012·6 cites·9 claims
- 0464US6617255B2Plasma processing method for working the surface of semiconductor devicesHITACHI LTD·Filed 2001·Granted Sep 9, 2003·7 cites·3 claims
- 0563US6709984B2Method for manufacturing semiconductor deviceHITACHI HIGH TECH CORP·Filed 2002·Granted Mar 23, 2004·9 cites·2 claims
- 0654US9018075B2Plasma processing methodITO TORU·Filed 2012·Granted Apr 28, 2015·1 cites·18 claims
- 0750US7098138B2Plasma processing method for working the surface of semiconductor devicesHITACHI LTD·Filed 2003·Granted Aug 29, 2006·2 cites·2 claims
- 0849US2006048892A1Plasma processing method for working the surface of semiconductor devicesARASE TAKAO·Filed 2005·Application pending·0 cites
- 0937US2014151327A1Plasma etching methodHITACHI HIGH TECH CORP·Filed 2013·Application pending·0 cites
- 1036US2004048477A1Method for manufacturing semiconductor deviceFiled 2003·Application pending·0 cites
- 1134US8486291B2Plasma processing methodOHMORI TAKESHI·Filed 2011·Granted Jul 16, 2013·0 cites·9 claims
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