Inventor · disambiguated record
Akio Ui
Also filed as: UI AKIO
22 granted patents·12 pending applications·724 citations·filing 1992–2021
95Inventor score
Top patents by PatentIndex Score
34 records- 0197US10388544B2Substrate processing apparatus and substrate processing methodTOSHIBA KK·Filed 2015·Granted Aug 20, 2019·45 cites·4 claims
- 0297US5403630AVapor-phase growth method for forming S2 O2 filmsTOSHIBA KK·Filed 1993·Granted Apr 4, 1995·458 cites·48 claims
- 0395US8821684B2Substrate plasma processing apparatus and plasma processing methodUI AKIO·Filed 2009·Granted Sep 2, 2014·52 cites·5 claims
- 0488US10332906B2Dry etching method and method for manufacturing semiconductor deviceTOSHIBA MEMORY CORP·Filed 2017·Granted Jun 25, 2019·6 cites·13 claims
- 0586US6164295ACVD apparatus with high throughput and cleaning method thereforTOSHIBA KK·Filed 1997·Granted Dec 26, 2000·79 cites·13 claims
- 0685US9934944B2Plasma induced flow electrode structure, plasma induced flow generation device, and method of manufacturing plasma induced flow electrode structureTOSHIBA KK·Filed 2016·Granted Apr 3, 2018·5 cites·15 claims
- 0777US8821744B2Substrate processing method and substrate processing apparatusUI AKIO·Filed 2011·Granted Sep 2, 2014·4 cites·9 claims
- 0877US7851367B2Method for plasma processing a substrateTOSHIBA KK·Filed 2007·Granted Dec 14, 2010·4 cites·10 claims
- 0975US7247888B2Film forming ring and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2005·Granted Jul 24, 2007·5 cites·17 claims
- 1073US8545670B2Plasma processing apparatus and plasma processing methodKOJIMA AKIHIRO·Filed 2008·Granted Oct 1, 2013·4 cites·5 claims
- 1171US12087556B2Plasma processing apparatus and plasma processing methodKIOXIA CORP·Filed 2021·Granted Sep 10, 2024·0 cites·8 claims
- 1269US9468698B2Gas processing apparatusTOSHIBA KK·Filed 2015·Granted Oct 18, 2016·1 cites·11 claims
- 1369US8548787B2Simulating a chemical reaction phenomenon in a semiconductor processTAMAOKI NAOKI·Filed 2006·Granted Oct 1, 2013·2 cites·9 claims
- 1468US9799482B2Device manufacturing apparatus and manufacturing method of magnetic device using structure to pass ion beamTOSHIBA MEMORY CORP·Filed 2016·Granted Oct 24, 2017·1 cites·20 claims
- 1567US5976992AMethod of supplying excited oxygenTOSHIBA KK·Filed 1994·Granted Nov 2, 1999·40 cites·11 claims
- 1665US10381198B2Plasma processing apparatus and plasma processing methodTOSHIBA MEMORY CORP·Filed 2013·Granted Aug 13, 2019·1 cites·13 claims
- 1761US9583360B2Substrate processing apparatus and substrate processing methodUI AKIO·Filed 2012·Granted Feb 28, 2017·1 cites·8 claims
- 1861US8252193B2Plasma processing apparatus of substrate and plasma processing method thereofUI AKIO·Filed 2008·Granted Aug 28, 2012·1 cites·9 claims
- 1955US11497110B2Dielectric barrier discharge electrode and dielectric barrier discharge deviceTOSHIBA KK·Filed 2021·Granted Nov 8, 2022·0 cites·15 claims
- 2055US10518270B2Dust collector and air conditionerTOSHIBA KK·Filed 2017·Granted Dec 31, 2019·0 cites·11 claims
- 2154US5205870AVapor deposition apparatusTOSHIBA KK·Filed 1992·Granted Apr 27, 1993·15 cites·29 claims
- 2254US2010072172A1Substrate processing apparatus and substrate processing methodUI AKIO·Filed 2009·Application pending·0 cites
- 2354US2017186589A1Plasma processing apparatus and plasma processing methdoTOSHIBA KK·Filed 2017·Application pending·0 cites
- 2451US2022299221A1Plasma disinfection deviceTOSHIBA KK·Filed 2021·Application pending·0 cites
- 2550US2017169996A1Plasma processing apparatus and plasma processing methdoTOSHIBA KK·Filed 2017·Application pending·0 cites
- 2650US2016027619A1Plasma processing apparatus and plasma processing methodTOSHIBA KK·Filed 2015·Application pending·0 cites
- 2749US2013061870A1Method of cleaning film forming apparatusUI AKIO·Filed 2012·Application pending·0 cites
- 2847US2022087002A1Dielectric barrier discharge deviceTOSHIBA KK·Filed 2021·Application pending·0 cites
- 2946US2019282722A1Gas processing apparatusTOSHIBA KK·Filed 2018·Application pending·0 cites
- 3045US2008053818A1Plasma processing apparatus of substrate and plasma processing method thereofTOSHIBA KK·Filed 2007·Application pending·0 cites
- 3143US2017007958A1Gas Processing ApparatusTOSHIBA KK·Filed 2016·Application pending·0 cites
- 3241US2019259579A1Plasma actuator and surface cleaning deviceTOSHIBA KK·Filed 2018·Application pending·0 cites
- 3340US10672615B2Plasma processing apparatus and plasma processing methodTOSHIBA MEMORY CORP·Filed 2017·Granted Jun 2, 2020·0 cites·15 claims
- 3429US2011223750A1Method for manufacturing semiconductor device and semiconductor manufacturing apparatusHAYASHI HISATAKA·Filed 2011·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →