Inventor · disambiguated record
Isamu Mori
Also filed as: MORI ISAMU
14 granted patents·15 pending applications·186 citations·filing 1998–2017
90Inventor score
Top patents by PatentIndex Score
29 records- 0193US6347832B2Child seatCOMBI CO·Filed 2001·Granted Feb 19, 2002·79 cites·6 claims
- 0288US9017571B2Dry etching agent and dry etching methodUMEZAKI TOMONORI·Filed 2011·Granted Apr 28, 2015·12 cites·20 claims
- 0386US6299249B1Child seatCOMBI CO·Filed 1999·Granted Oct 9, 2001·72 cites·11 claims
- 0483US9234133B2Etching gasCENTRAL GLASS CO LTD·Filed 2014·Granted Jan 12, 2016·4 cites·13 claims
- 0570US9238872B2Method for synthesizing fluorine compound by electrolysis and electrode thereforMORI ISAMU·Filed 2012·Granted Jan 19, 2016·1 cites·4 claims
- 0668US9524877B2Silicon dry etching methodCENTRAL GLASS CO LTD·Filed 2014·Granted Dec 20, 2016·2 cites·8 claims
- 0764US2014360884A1Fluorine Gas Generating DeviceCENTRAL GLASS CO LTD·Filed 2014·Application pending·0 cites
- 0860US9165776B2Dry etching methodUMEZAKI TOMONORI·Filed 2012·Granted Oct 20, 2015·1 cites·7 claims
- 0955US9230821B2Dry etching agent and dry etching method using the sameCENTRAL GLASS CO LTD·Filed 2014·Granted Jan 5, 2016·0 cites·11 claims
- 1055US8105566B2Method for producing oxygen-containing halogenated fluorideMORI ISAMU·Filed 2009·Granted Jan 31, 2012·0 cites·1 claims
- 1153US2010239485A1Method of manufacturing fluorinated gas compounds and apparatus for manufacturing the sameCENTRAL GLASS CO LTD·Filed 2008·Application pending·0 cites
- 1252US7417167B2Process for producing carbonyl difluorideCENTRAL GLASS CO LTD·Filed 2002·Granted Aug 26, 2008·1 cites·34 claims
- 1352US6673262B1Gas for removing deposit and removal method using sameCENTRAL GLASS CO LTD·Filed 1998·Granted Jan 6, 2004·14 cites·15 claims
- 1452US2011150747A1Method for Manufacturing Oxygen-Containing Halogenated FluorideCENTRAL GLASS CO LTD·Filed 2009·Application pending·0 cites
- 1551US10872780B2Dry etching agent composition and dry etching methodCENTRAL GLASS CO LTD·Filed 2017·Granted Dec 22, 2020·0 cites·9 claims
- 1650US2015047680A1Method for Dry-Cleaning Metal Film in Film-Formation ApparatusCENTRAL GLASS CO LTD·Filed 2013·Application pending·0 cites
- 1748US2012031752A1Fluorine Gas Generating DeviceMORI ISAMU·Filed 2010·Application pending·0 cites
- 1848US2010247412A1Method for Removal of CIO3FCENTRAL GLASS CO LTD·Filed 2008·Application pending·0 cites
- 1946US2009068083A1Process for synthesis of halogenated nitrogenCENTRAL GLASS CO LTD·Filed 2006·Application pending·0 cites
- 2045US9093388B2Dry etching agent and dry etching method using the sameHIBINO YASUO·Filed 2011·Granted Jul 28, 2015·0 cites·7 claims
- 2144US8562751B2Dry cleaning method of substrate processing apparatusGUNJI ISAO·Filed 2012·Granted Oct 22, 2013·0 cites·19 claims
- 2244US2013032600A1Valve For Container Filled With Halogen Gas Or Halogen Compound GasCENTRAL GLASS CO LTD·Filed 2011·Application pending·0 cites
- 2339US2012085640A1Fluorine Gas Generation DeviceMIYAZAKI TATSUO·Filed 2010·Application pending·0 cites
- 2439US2012231630A1Etching GasTAKADA NAOTO·Filed 2010·Application pending·0 cites
- 2536US2012100491A1Semiconductor Production Equipment Including Fluorine Gas GeneratorMORI ISAMU·Filed 2010·Application pending·0 cites
- 2634US2014302683A1Dry etching agentKIKUCHI AKIOU·Filed 2012·Application pending·0 cites
- 2734US2002000743A1Child safety seatCOMBI CO·Filed 2001·Application pending·0 cites
- 2831US2012006487A1System for In-Situ Mixing and Diluting Fluorine GasKIKUCHI AKIOU·Filed 2010·Application pending·0 cites
- 2930US2012234351A1Cleaning GasTAKADA NAOTO·Filed 2010·Application pending·0 cites
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