Inventor · disambiguated record
Kwang-Sub Yoon
Also filed as: YOON KWANG-SUB
23 granted patents·6 pending applications·120 citations·filing 2000–2017
94Inventor score
Top patents by PatentIndex Score
29 records- 0187US6800418B2Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Oct 5, 2004·27 cites·57 claims
- 0286US6844134B2Photosenseitive polymer having fluorinated ethylene glycol group and chemically amplified resist composition comprising the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Jan 18, 2005·26 cites·50 claims
- 0382US6537727B2Resist composition comprising photosensitive polymer having loctone in its backboneSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Mar 25, 2003·16 cites·18 claims
- 0481US9557655B2Photomask including focus metrology mark, substrate target including focus monitor pattern, metrology method for lithography process, and method of manufacturing integrated circuit deviceKIM JI-MYUNG·Filed 2015·Granted Jan 31, 2017·6 cites·20 claims
- 0580US7387988B2Thinner composition and method of removing photoresist using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jun 17, 2008·4 cites·12 claims
- 0678US6696217B2Photosensitive monomer, photosensitive polymer and chemically amplified resist composition comprising lactone group having acid-labile protecting groupSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Feb 24, 2004·8 cites·55 claims
- 0775US9312188B2Method for fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Apr 12, 2016·3 cites·22 claims
- 0873US7449383B2Method of manufacturing a capacitor and method of manufacturing a dynamic random access memory device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Nov 11, 2008·4 cites·20 claims
- 0971US7863231B2Thinner composition and method of removing photoresist using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Jan 4, 2011·1 cites·6 claims
- 1069US9123655B2Methods of forming layer patterns of a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Sep 1, 2015·2 cites·20 claims
- 1169US8263487B2Method of forming patterns of semiconductor deviceYOON DONG-KI·Filed 2009·Granted Sep 11, 2012·3 cites·9 claims
- 1267US9927720B2Substrate target for in-situ lithography metrology, metrology method for in-situ lithography, and method of manufacturing integrated circuit device by using in-situ metrologySAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Mar 27, 2018·2 cites·17 claims
- 1365US10553429B2Method of forming pattern of semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Feb 4, 2020·1 cites·20 claims
- 1465US10276373B2Method of manufacturing a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Apr 30, 2019·1 cites·13 claims
- 1563US10553438B2Semiconductor device and method for fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Feb 4, 2020·1 cites·19 claims
- 1662US6642336B1Photosensitive polymerSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Nov 4, 2003·6 cites·21 claims
- 1761US7457058B2Optical element holder and projection exposure apparatus having the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Nov 25, 2008·1 cites·17 claims
- 1856US6596459B1Photosensitive polymer and resist composition containing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Jul 22, 2003·4 cites·16 claims
- 1944US9373698B2Methods of manufacturing semiconductor devices and electronic devicesSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Jun 21, 2016·0 cites·20 claims
- 2044US7241552B2Resist composition comprising photosensitive polymer having lactone in its backboneSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Jul 10, 2007·0 cites·8 claims
- 2144US2016190142A1Method for fabricating semiconductor deviceKIM JU-YOUN·Filed 2016·Application pending·0 cites
- 2242US7045267B2Resist composition comprising photosensitive polymer having lactone in its backboneSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted May 16, 2006·0 cites·24 claims
- 2339US2006284259A1Semiconductor device and method of manufacturing the sameLEE JUNG-HYEON·Filed 2006·Application pending·0 cites
- 2437US7202011B2Photosensitive polymer including fluorine and resist composition containing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Apr 10, 2007·2 cites·22 claims
- 2537US6933096B2Photosensitive polymer including fluorine, resist composition containing the same and patterning method using the resist compositionSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Aug 23, 2005·2 cites·8 claims
- 2635US2006073670A1Method of manufacturing a semiconductor deviceBAE YONG-KUG·Filed 2005·Application pending·0 cites
- 2734US2017194210A1Semiconductor device and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
- 2832US2006115954A1Methods of manufacturing a capacitor and a semiconductor deviceSHIM WOO-SEOK·Filed 2005·Application pending·0 cites
- 2931US2016025484A1Overlay measurement device and method and method of forming overlay patternSAMSUNG ELECTRONICS CO LTD·Filed 2015·Application pending·0 cites
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