P

Inventor

KIM HYUN-WOO

KR194 patents
⚠️ This page may combine multiple inventors who share the name “KIM HYUN-WOO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAMSUNG ELECTRONICS CO LTD

29 patents
US9520289B2Dec 13, 2016

Methods of forming a pattern of a semiconductor device

SAMSUNG ELECTRONICS CO LTD374 citations99
US7254257B2Aug 7, 2007

Method and apparatus of recognizing face using component-based 2nd-order principal component analysis (PCA)/independent component analysis (ICA)

SAMSUNG ELECTRONICS CO LTD137 citations98
US7203346B2Apr 10, 2007

Face recognition method and apparatus using component-based face descriptor

SAMSUNG ELECTRONICS CO LTD82 citations98
US8039196B2Oct 18, 2011

Method of forming fine patterns using a block copolymer

SAMSUNG ELECTRONICS CO LTD76 citations97
US9250768B2Feb 2, 2016

Tablet having user interface

SAMSUNG ELECTRONICS CO LTD44 citations94
US10217816B2Feb 26, 2019

Semiconductor device

SAMSUNG ELECTRONICS CO LTD15 citations93
US9772555B2Sep 26, 2017

Methods of forming patterns using photoresists

SAMSUNG ELECTRONICS CO LTD52 citations93
US6517990B1Feb 11, 2003

Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same

SAMSUNG ELECTRONICS CO LTD40 citations93
US7855038B2Dec 21, 2010

Mask patterns for semiconductor device fabrication and related methods and structures

SAMSUNG ELECTRONICS CO LTD21 citations92
US7391889B2Jun 24, 2008

Method and apparatus for extracting feature vector used for face recognition and retrieval

SAMSUNG ELECTRONICS CO LTD26 citations92
US7361609B2Apr 22, 2008

Mask patterns for semiconductor device fabrication and related methods

SAMSUNG ELECTRONICS CO LTD27 citations92
US7314691B2Jan 1, 2008

Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device

SAMSUNG ELECTRONICS CO LTD18 citations92
US7298931B2Nov 20, 2007

Image retrieval method and apparatus using iterative matching

SAMSUNG ELECTRONICS CO LTD29 citations92
US7164781B2Jan 16, 2007

Method and apparatus of recognizing face using 2nd-order independent component analysis (ICA)/principal component analysis (PCA)

SAMSUNG ELECTRONICS CO LTD28 citations92
US6964839B1Nov 15, 2005

Photosensitive polymer having cyclic backbone and resist composition containing the same

SAMSUNG ELECTRONICS CO LTD22 citations92
US6537727B2Mar 25, 2003

Resist composition comprising photosensitive polymer having loctone in its backbone

SAMSUNG ELECTRONICS CO LTD16 citations92
US11451875B2Sep 20, 2022

Machine learning-based approach to demographic attribute inference using time-sensitive features

SAMSUNG ELECTRONICS CO LTD9 citations86
US10983558B2Apr 20, 2021

Biometric sensor and device including the same

SAMSUNG ELECTRONICS CO LTD10 citations85
US7384730B2Jun 10, 2008

Top coating composition for photoresist and method of forming photoresist pattern using same

SAMSUNG ELECTRONICS CO LTD13 citations84
US8895226B2Nov 25, 2014

Coating composition for DUV filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method

SAMSUNG ELECTRONICS CO LTD6 citations83
US8053163B2Nov 8, 2011

Method of fine patterning semiconductor device

SAMSUNG ELECTRONICS CO LTD9 citations83
US10777623B2Sep 15, 2020

Electronic device including display with expanded sensor operability

SAMSUNG ELECTRONICS CO LTD7 citations82
US10134606B2Nov 20, 2018

Method of forming patterns and method of manufacturing integrated circuit device using the same

SAMSUNG ELECTRONICS CO LTD9 citations79
US6677100B2Jan 13, 2004

Photosensitive polymer containing Si, Ge or Sn and resist composition comprising the same

SAMSUNG ELECTRONICS CO LTD7 citations74
US6673513B2Jan 6, 2004

Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same

SAMSUNG ELECTRONICS CO LTD9 citations74
US6627382B2Sep 30, 2003

Fluoro-containing photosensitive polymer and photoresist composition containing the same

SAMSUNG ELECTRONICS CO LTD8 citations74
US10234760B2Mar 19, 2019

Photoresist compositions, intermediate products, and methods of manufacturing patterned devices and semiconductor devices

SAMSUNG ELECTRONICS CO LTD2 citations73
US9073714B2Jul 7, 2015

Image forming apparatus with a multi-feeding prevention member

SAMSUNG ELECTRONICS CO LTD6 citations73
US7604911B2Oct 20, 2009

Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating, composition for fine pattern formation, and method of fabricating semiconductor device

SAMSUNG ELECTRONICS CO LTD5 citations73

HYUNDAI ELECTRONICS IND

2 patents

KIM HYUN-WOO

2 patents

ELECTRONICS & TELECOMMUNICATIONS RES INST

2 patents

ILJIN CO LTD

2 patents

SAMSUNG DISPLAY DEVICES LTD

1 patent

YANG HEESIK

1 patent

ICURE PHARMACEUTICAL CORP

1 patent

KOREA ELECTRONICS TELECOMM

1 patent

KOH CHA-WON

1 patent

HYUNDAI MOTOR CO LTD

1 patent

KIM KYOUNG TAEK

1 patent

YI SHI-YONG

1 patent

KOREA ADVANCED INST SCI & TECH

1 patent

HONOR DEVICE CO LTD

1 patent

SAMSUNG DISPLAY CO LTD

1 patent

LG CHEMICAL LTD

1 patent

SHINETSU CHEMICAL CO

1 patent

Showing the top 50 of 194 patents by PatentIndex Score.