Inventor · disambiguated record
Grzegorz Grzela
Also filed as: GRZELA GRZEGORZ
10 granted patents·2 pending applications·21 citations·filing 2017–2024
83Inventor score
Files withASML NETHERLANDS BV12
Top patents by PatentIndex Score
12 records- 0197US11067902B2Computational metrologyASML NETHERLANDS BV·Filed 2018·Granted Jul 20, 2021·9 cites·20 claims
- 0294US10481506B2Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Nov 19, 2019·7 cites·24 claims
- 0382US10551750B2Metrology method and apparatus and associated computer productASML NETHERLANDS BV·Filed 2019·Granted Feb 4, 2020·2 cites·20 claims
- 0480US11009343B2Metrology apparatus and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2019·Granted May 18, 2021·2 cites·15 claims
- 0577US10310388B2Metrology method and apparatus and associated computer productASML NETHERLANDS BV·Filed 2018·Granted Jun 4, 2019·1 cites·20 claims
- 0675US11650047B2Metrology apparatus and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2021·Granted May 16, 2023·0 cites·20 claims
- 0775US2024412067A1Metrology Apparatus And Method For Determining A Characteristic Of One Or More Structures On A SubstrateASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 0874US12461451B2Computational metrologyASML NETHERLANDS BV·Filed 2021·Granted Nov 4, 2025·0 cites·20 claims
- 0966US2020050114A1Method of Measuring a Structure, Inspection Apparatus, Lithographic System and Device Manufacturing MethodASML NETHERLANDS BV·Filed 2019·Application pending·0 cites
- 1065US12013647B2Metrology methodASML NETHERLANDS BV·Filed 2019·Granted Jun 18, 2024·0 cites·12 claims
- 1154US12112260B2Metrology apparatus and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2019·Granted Oct 8, 2024·0 cites·19 claims
- 1246US10474043B2Method of measuring a property of a substrate, inspection apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Nov 12, 2019·0 cites·17 claims
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