Inventor · disambiguated record
Takayuki Katano
Also filed as: KATANO TAKAYUKI · YAMASHITA MASAMI
12 granted patents·404 citations·filing 1997–2007
93Inventor score
Technology areasH10P
Files withTOKYO ELECTRON LTD12
Top patents by PatentIndex Score
12 records- 0186US5876280ASubstrate treating system and substrate treating methodTOKYO ELECTRON LTD·Filed 1997·Granted Mar 2, 1999·91 cites·26 claims
- 0283US7401988B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2007·Granted Jul 22, 2008·7 cites·15 claims
- 0377US5944894ASubstrate treatment systemTOKYO ELECTRON LTD·Filed 1997·Granted Aug 31, 1999·54 cites·19 claims
- 0475US6617095B2Evaluating method of hydrophobic process, forming method of resist pattern, and forming system of resist patternTOKYO ELECTRON LTD·Filed 2001·Granted Sep 9, 2003·21 cites·18 claims
- 0574US6063439AProcessing apparatus and method using solutionTOKYO ELECTRON LTD·Filed 1998·Granted May 16, 2000·45 cites·17 claims
- 0674US5928390AVertical processing apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Jul 27, 1999·45 cites·49 claims
- 0773US6485203B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Nov 26, 2002·17 cites·16 claims
- 0870US6333003B1Treatment apparatus, treatment method, and impurity removing apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Dec 25, 2001·39 cites·6 claims
- 0968US5932380AMethod of processing resist utilizing alkaline component monitoringTOKYO ELECTRON LTD·Filed 1997·Granted Aug 3, 1999·29 cites·26 claims
- 1065US6017663AMethod of processing resist utilizing alkaline component monitoringTOKYO ELECTRON LTD·Filed 1999·Granted Jan 25, 2000·25 cites·28 claims
- 1164US6097469AMethod of processing resist onto substrate and resist processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Aug 1, 2000·24 cites·17 claims
- 1263US7208066B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2003·Granted Apr 24, 2007·7 cites·9 claims
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