Inventor · disambiguated record
Hiroaki Iwaoka
Also filed as: IWAOKA HIROAKI
10 granted patents·7 pending applications·3 citations·filing 2009–2025
79Inventor score
Top patents by PatentIndex Score
17 records- 0195US12001134B2Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective maskAGC INC·Filed 2023·Granted Jun 4, 2024·2 cites·19 claims
- 0291US11829065B2Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective maskAGC INC·Filed 2023·Granted Nov 28, 2023·1 cites·21 claims
- 0384US12298660B2Reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method for manufacturing sameAGC INC·Filed 2024·Granted May 13, 2025·0 cites·20 claims
- 0484US12105412B2Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective maskAGC INC·Filed 2024·Granted Oct 1, 2024·0 cites·14 claims
- 0583US12346018B2Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective maskAGC INC·Filed 2024·Granted Jul 1, 2025·0 cites·18 claims
- 0682US12235574B2Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective maskAGC INC·Filed 2024·Granted Feb 25, 2025·0 cites·22 claims
- 0782US2024427227A1Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective maskAGC INC·Filed 2024·Application pending·0 cites
- 0881US11953822B2Reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method for manufacturing sameAGC INC·Filed 2023·Granted Apr 9, 2024·0 cites·18 claims
- 0980US12222640B2Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective maskAGC INC·Filed 2023·Granted Feb 11, 2025·0 cites·18 claims
- 1079US12339580B2Reflective mask blank for EUV lithography and substrate equipped with conductive filmAGC INC·Filed 2024·Granted Jun 24, 2025·0 cites·28 claims
- 1179US2025216765A1Reflective mask blank for euv lithography, reflective mask for euv lithography, and method for manufacturing sameAGC INC·Filed 2025·Application pending·0 cites
- 1275US2025155792A1Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective maskAGC INC·Filed 2025·Application pending·0 cites
- 1375US2025258427A1Reflective mask blank for euv lithography and substrate equipped with conductive filmAGC INC·Filed 2025·Application pending·0 cites
- 1465US2025036020A1Reflective mask blank, reflective mask blank manufacturing method, reflective mask, and reflective mask manufacturing methodAGC INC·Filed 2024·Application pending·0 cites
- 1564US2024152044A1Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective maskAGC INC·Filed 2024·Application pending·0 cites
- 1649US2009242887A1Display Substrate Having a Transparent Conductive Layer Made of Zinc Oxide and Manufacturing Method ThereofCASIO COMPUTER CO LTD·Filed 2009·Application pending·0 cites
- 1737US10287676B2Thin film formation method, thin film, and glass plate having thin film attached theretoAGC INC·Filed 2016·Granted May 14, 2019·0 cites·4 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →