Inventor · disambiguated record
Osamu Nagarekawa
Also filed as: NAGAREKAWA OSAMU
4 granted patents·75 citations·filing 1983–2007
79Inventor score
Technology areasG03F
Top patents by PatentIndex Score
4 records- 0179US4530891APhoto-mask blank for use in lithography including a modified chromium compoundHOYA ELECTRONICS CO LTD·Filed 1983·Granted Jul 23, 1985·35 cites·20 claims
- 0268USD543160SPhotomask blankHOYA CORP·Filed 2004·Granted May 22, 2007·13 cites·1 claims
- 0361US4657648AMethod of manufacturing a mask blank including a modified chromium compoundNAGAREKAWA OSAMU·Filed 1984·Granted Apr 14, 1987·18 cites·7 claims
- 0458USD568839SPhotomask blankHOYA CORP·Filed 2007·Granted May 13, 2008·9 cites·1 claims
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