Inventor · disambiguated record
Masaru Mitsui
Also filed as: MITSUI MASARU
24 granted patents·2 pending applications·288 citations·filing 1995–2010
96Inventor score
Top patents by PatentIndex Score
26 records- 0190US6037083AHalftone phase shift mask blanks, halftone phase shift masks, and fine pattern forming methodHOYA CORP·Filed 1998·Granted Mar 14, 2000·81 cites·18 claims
- 0287US8039178B2Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masksHOYA CORP·Filed 2010·Granted Oct 18, 2011·4 cites·26 claims
- 0387US5942356APhase shift mask and phase shift mask blankHOYA CORP·Filed 1997·Granted Aug 24, 1999·56 cites·32 claims
- 0485US7833387B2Mask blank manufacturing method and sputtering target for manufacturing the sameHOYA CORP·Filed 2005·Granted Nov 16, 2010·6 cites·23 claims
- 0577US5635315APhase shift mask and phase shift mask blankHOYA CORP·Filed 1995·Granted Jun 3, 1997·31 cites·15 claims
- 0672US6762000B2Phase shift mask blank, photo mask blank and manufacturing apparatus and method of blanksHOYA CORP·Filed 2001·Granted Jul 13, 2004·10 cites·12 claims
- 0769US6242138B1Phase shift mask and phase shift mask blankHOYA CORP·Filed 2000·Granted Jun 5, 2001·8 cites·19 claims
- 0868USD543160SPhotomask blankHOYA CORP·Filed 2004·Granted May 22, 2007·13 cites·1 claims
- 0963US5804337APhase shift mask and phase shift mask blankHOYA CORP·Filed 1996·Granted Sep 8, 1998·16 cites·28 claims
- 1062US6723477B2Method for manufacturing phase shift mask blank and method for manufacturing phase shift maskHOYA CORP·Filed 2001·Granted Apr 20, 2004·6 cites·18 claims
- 1159US7217481B2Photomask blank, photomask, methods of manufacturing the same and methods of forming micropatternHOYA CORP·Filed 2005·Granted May 15, 2007·2 cites·16 claims
- 1258USD568839SPhotomask blankHOYA CORP·Filed 2007·Granted May 13, 2008·9 cites·1 claims
- 1356US6475681B2Phase shift mask and phase shift mask blankHOYA CORP·Filed 2001·Granted Nov 5, 2002·3 cites·16 claims
- 1454US7026077B2Photomask blank manufacturing methodHOYA CORP·Filed 2003·Granted Apr 11, 2006·1 cites·6 claims
- 1554US6153341APhase shift mask and phase shift mask blankHOYA CORP·Filed 1999·Granted Nov 28, 2000·11 cites·6 claims
- 1653US6899979B1Photomask blank, photomask, methods of manufacturing the same, and method of forming micropatternHOYO CORP·Filed 1999·Granted May 31, 2005·17 cites·55 claims
- 1752US7601468B2Process for manufacturing half-tone phase shifting mask blanksHOYA CORP·Filed 2006·Granted Oct 13, 2009·0 cites·5 claims
- 1851US7862960B2Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masksHOYA CORP·Filed 2005·Granted Jan 4, 2011·0 cites·12 claims
- 1950US2007034499A1Phase shift mask blank, photo mask blank, and manufacturing apparatus and method of blanksHOYA CORP·Filed 2006·Application pending·0 cites
- 2047US7141339B2Process for manufacturing half-tone phase shifting mask blanksHOYA CORP·Filed 2003·Granted Nov 28, 2006·1 cites·25 claims
- 2145USD537048SPhotomask blankHOYA CORP·Filed 2004·Granted Feb 20, 2007·5 cites·1 claims
- 2244US7635950B2Short-arc type high pressure discharge lamp having gaps formed among electrode axes, metal foils and a glass material surfaceSONY CORP·Filed 2006·Granted Dec 22, 2009·0 cites·6 claims
- 2339US2004058254A1Phase shift mask blank, photo mask blank, and manufacturing apparatus and method of blanksHOYA CORP·Filed 2003·Application pending·0 cites
- 2438US5849439AMethod for preparing phase shift mask blank, and phase maskHOYA CORP·Filed 1996·Granted Dec 15, 1998·5 cites·22 claims
- 2537US5858582APhase shift mask and phase shift mask blankHOYA CORP·Filed 1998·Granted Jan 12, 1999·3 cites·7 claims
- 2633US8652306B2Method for manufacturing mask blank, method for manufacturing transfer mask, sputtering target for manufacturing mask blankMITSUI MASARU·Filed 2003·Granted Feb 18, 2014·0 cites·14 claims
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