Inventor · disambiguated record
Masayoshi Ikeda
Also filed as: IKEDA MASAYOSHI
28 granted patents·15 pending applications·210 citations·filing 1987–2017
96Inventor score
Top patents by PatentIndex Score
43 records- 0187US9564360B2Substrate processing method and method of manufacturing semiconductor deviceCANON ANELVA CORP·Filed 2016·Granted Feb 7, 2017·7 cites·17 claims
- 0284US8231767B2Magnetic field generating apparatus and plasma processing apparatusIORI KAZUYUKI·Filed 2010·Granted Jul 31, 2012·10 cites·6 claims
- 0380US7615133B2Electrostatic chuck module and cooling systemTOTO LTD·Filed 2002·Granted Nov 10, 2009·33 cites·8 claims
- 0480US7220319B2Electrostatic chucking stage and substrate processing apparatusCANON ANELVA CORP·Filed 2003·Granted May 22, 2007·25 cites·18 claims
- 0578US9601688B2Method of manufacturing magnetoresistive element and method of processing magnetoresistive filmCANON ANELVA CORP·Filed 2014·Granted Mar 21, 2017·3 cites·12 claims
- 0678US7175737B2Electrostatic chucking stage and substrate processing apparatusCANON ANELVA CORP·Filed 2003·Granted Feb 13, 2007·23 cites·9 claims
- 0775US9844126B2Plasma treatment apparatusIKEDA MASAYOSHI·Filed 2012·Granted Dec 12, 2017·4 cites·5 claims
- 0875US9190287B2Method of fabricating fin FET and method of fabricating deviceCANON ANELVA CORP·Filed 2014·Granted Nov 17, 2015·3 cites·10 claims
- 0975US8778151B2Plasma processing apparatusIKEDA MASAYOSHI·Filed 2010·Granted Jul 15, 2014·5 cites·5 claims
- 1071US6078671ASilencer for attenuating a sound or noise transmitted through an air passage of a ductEBARA CORP·Filed 1997·Granted Jun 20, 2000·30 cites·20 claims
- 1169US2009173444A1Surface processing apparatusCANON ANELVA CORP·Filed 2009·Application pending·0 cites
- 1267US8970213B2Method for manufacturing magnetoresistance effect elementTOYOSATO TOMOHIKO·Filed 2012·Granted Mar 3, 2015·3 cites·6 claims
- 1366USRE42175EElectrostatic chucking stage and substrate processing apparatusCANON ANELVA CORP·Filed 2009·Granted Mar 1, 2011·2 cites·26 claims
- 1466US2008156440A1Surface processing apparatusCANON ANELVA CORP·Filed 2007·Application pending·0 cites
- 1565US6532796B1Method of substrate temperature control and method of assessing substrate temperature controllabilityANELVA CORP·Filed 1999·Granted Mar 18, 2003·26 cites·2 claims
- 1665US2008053614A1Surface Processing ApparatusCANON ANELVA CORP·Filed 2007·Application pending·0 cites
- 1763US6774570B2RF plasma processing method and RF plasma processing systemANELVA CORP·Filed 2003·Granted Aug 10, 2004·15 cites·30 claims
- 1861US6426299B1Method and apparatus for manufacturing semiconductor deviceNEC CORP·Filed 2000·Granted Jul 30, 2002·7 cites·19 claims
- 1959US10214070B2Vehicle height adjustment deviceSHOWA CORP·Filed 2017·Granted Feb 26, 2019·1 cites·13 claims
- 2059US2008113149A1Surface processing apparatusANELVA CORP·Filed 2007·Application pending·0 cites
- 2158US7767056B2High-frequency plasma processing apparatusCANON ANELVA CORP·Filed 2007·Granted Aug 3, 2010·0 cites·17 claims
- 2256US7513063B2Substrate processing apparatusCANON ANELVA CORP·Filed 2003·Granted Apr 7, 2009·5 cites·16 claims
- 2354US7976716B2Semiconductor device manufacturing methodCANON ANELVA CORP·Filed 2009·Granted Jul 12, 2011·0 cites·1 claims
- 2453US8007633B2Surface processing apparatusCANON ANELVA CORP·Filed 2011·Granted Aug 30, 2011·0 cites·3 claims
- 2551US2008014363A1Electro-Static Chucking Mechanism and Surface Processing ApparatusCANON ANELVA CORP·Filed 2007·Application pending·0 cites
- 2648US2010147801A1High-Frequency Plasma Processing ApparatusCANON ANELVA CORP·Filed 2010·Application pending·0 cites
- 2747US10157961B2Method of manufacturing magnetoresistive elementCANON ANELVA CORP·Filed 2017·Granted Dec 18, 2018·0 cites·12 claims
- 2847US2003047282A1Surface processing apparatusFiled 2002·Application pending·0 cites
- 2946US10226978B2Vehicle height adjustment deviceSHOWA CORP·Filed 2017·Granted Mar 12, 2019·0 cites·12 claims
- 3046US10214069B2Vehicle height adjustment deviceSHOWA CORP·Filed 2017·Granted Feb 26, 2019·0 cites·8 claims
- 3144US10046615B2Vehicle height adjustment deviceSHOWA CORP·Filed 2017·Granted Aug 14, 2018·0 cites·4 claims
- 3243US2016204342A1Method of manufacturing magnetoresistive element and manufacturing system for the sameCANON ANELVA CORP·Filed 2016·Application pending·0 cites
- 3342US2009283976A1Substrate holding apparatusCANON ANELVA CORP·Filed 2009·Application pending·0 cites
- 3440US2003024478A1Surface processing apparatusANELVA CORP·Filed 2002·Application pending·0 cites
- 3538US7323081B2High-frequency plasma processing apparatusCANON ANELVA CORP·Filed 2003·Granted Jan 29, 2008·0 cites·11 claims
- 3638US2001054389A1Electro-static chucking mechanism and surface processing apparatusFiled 2001·Application pending·0 cites
- 3736US2010276275A1Method of generating fine metal particles, method of manufacturing metal-containing paste, and method of forming thin metal film interconnectionCANON ANELVA CORP·Filed 2010·Application pending·0 cites
- 3834US4867843ASurface roughening of ceramics and application to production of ceramic wiring boardHITACHI CHEMICAL CO LTD·Filed 1988·Granted Sep 19, 1989·6 cites·7 claims
- 3931US7011744B2Brine supply unitANELVA CORP·Filed 2002·Granted Mar 14, 2006·0 cites·7 claims
- 4031US2012073960A1Magnetron sputtering apparatus and electronic component manufacturing methodSHIBUYA YOHSUKE·Filed 2011·Application pending·0 cites
- 4130US4842899AProcess for forming metallic film on inorganic materialHITACHI CHEMICAL CO LTD·Filed 1987·Granted Jun 27, 1989·2 cites·5 claims
- 4230US2001052359A1Method of substrate temperature control and method of assessing substrate temperature controllabilityFiled 1999·Application pending·0 cites
- 4330US2001017205A1Method of substrate temperature control and method of assessing substrate temperature controllabilityFiled 1999·Application pending·0 cites
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