Inventor · disambiguated record
Shunichi Iimuro
Also filed as: IIMURO SHUNICHI
8 granted patents·2 pending applications·1,315 citations·filing 1987–2007
92Inventor score
Technology areasH10P
Top patents by PatentIndex Score
10 records- 0195US8343280B2Multi-zone substrate temperature control system and method of operatingTOKYO ELECTRON LTD·Filed 2006·Granted Jan 1, 2013·48 cites·20 claims
- 0295US6110287APlasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Aug 29, 2000·397 cites·2 claims
- 0395US4812201AMethod of ashing layers, and apparatus for ashing layersTOKYO ELECTRON LTD·Filed 1987·Granted Mar 14, 1989·481 cites·4 claims
- 0491US5423936APlasma etching systemHITACHI LTD·Filed 1993·Granted Jun 13, 1995·177 cites·5 claims
- 0587US5593540APlasma etching system and plasma etching methodHITACHI LTD·Filed 1995·Granted Jan 14, 1997·92 cites·13 claims
- 0684US5445709AAnisotropic etching method and apparatusHITACHI LTD·Filed 1993·Granted Aug 29, 1995·84 cites·15 claims
- 0767US5766498AAnisotropic etching method and apparatusHITACHI LTD·Filed 1996·Granted Jun 16, 1998·31 cites·23 claims
- 0844US2008217293A1Processing system and method for performing high throughput non-plasma processingTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 0936US2004200804A1Method of processing quartz member for plasma processing device, quartz member for plasma processing device, and plasma processing device having quartz member for plasma processing device mounted thereonFiled 2002·Application pending·0 cites
- 1034US6589435B1Plasma etching methodTOKYO ELECTRON LTD·Filed 1999·Granted Jul 8, 2003·5 cites·11 claims
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