Inventor · disambiguated record
Yu Wamura
Also filed as: WAMURA YU
15 granted patents·5 pending applications·346 citations·filing 2010–2024
91Inventor score
Top patents by PatentIndex Score
20 records- 0196US9748104B2Method of depositing filmTOKYO ELECTRON LTD·Filed 2014·Granted Aug 29, 2017·280 cites·16 claims
- 0294US12368030B2Deposition method and deposition apparatusTOKYO ELECTRON LTD·Filed 2023·Granted Jul 22, 2025·1 cites·9 claims
- 0393US8992685B2Substrate processing apparatus, substrate processing method, and computer-readable storage mediumKATO HITOSHI·Filed 2010·Granted Mar 31, 2015·18 cites·15 claims
- 0493US8896097B2Method of manufacturing capacitor, capacitor and method of forming dielectric film for use in capacitorTOKYO ELECTRON LTD·Filed 2013·Granted Nov 25, 2014·16 cites·13 claims
- 0592US9929008B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Mar 27, 2018·12 cites·19 claims
- 0682US9293543B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Mar 22, 2016·5 cites·19 claims
- 0780US9435026B2Film deposition apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Sep 6, 2016·4 cites·6 claims
- 0873US9080238B2Raw material supplying device and film forming apparatusWAMURA YU·Filed 2011·Granted Jul 14, 2015·4 cites·9 claims
- 0969US9165780B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2013·Granted Oct 20, 2015·2 cites·6 claims
- 1068US8895456B2Method of depositing a filmTOKYO ELECTRON LTD·Filed 2013·Granted Nov 25, 2014·2 cites·20 claims
- 1164US9103029B2Processing apparatus and film forming methodWAMURA YU·Filed 2011·Granted Aug 11, 2015·2 cites·10 claims
- 1261US2024401199A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1354US10793432B2Output inspection method for ozone mass flow controllerTOKYO ELECTRON LTD·Filed 2018·Granted Oct 6, 2020·0 cites·10 claims
- 1453US2013340678A1Gas supply apparatus and film forming apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1552US10053776B2Method of detoxifying exhaust pipe and film forming apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Aug 21, 2018·0 cites·12 claims
- 1651US2013205611A1Gas supply apparatus and heat treatment apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1747US10472719B2Nozzle and substrate processing apparatus using sameTOKYO ELECTRON LTD·Filed 2015·Granted Nov 12, 2019·0 cites·19 claims
- 1847US9418837B2Semiconductor device manufacturing method and substrate treatment systemTOKYO ELECTRON LTD·Filed 2014·Granted Aug 16, 2016·0 cites·7 claims
- 1947US2013240479A1Method for producing filtration filterTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 2043US2014126980A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
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