Inventor · disambiguated record
Shinichiro Senda
Also filed as: SENDA SHINICHIRO
12 granted patents·3 pending applications·11 citations·filing 2009–2018
83Inventor score
Top patents by PatentIndex Score
15 records- 0187US10658163B2Tantalum sputtering target, and production method thereforJX NIPPON MINING & METALS CORP·Filed 2016·Granted May 19, 2020·2 cites·1 claims
- 0287US9085819B2Tantalum sputtering targetSENDA SHINICHIRO·Filed 2011·Granted Jul 21, 2015·5 cites·18 claims
- 0376US10354846B2Sputtering target-backing plate assemblyJX NIPPON MINING & METALS CORP·Filed 2014·Granted Jul 16, 2019·1 cites·6 claims
- 0467US9051645B2Barrier film for semiconductor wiring, sintered compact sputtering target and method of producing the sputtering targetSENDA SHINICHIRO·Filed 2010·Granted Jun 9, 2015·2 cites·14 claims
- 0562US9859104B2Tantalum sputtering target and production method thereforJX NIPPON MINING & METALS CORP·Filed 2014·Granted Jan 2, 2018·0 cites·15 claims
- 0661US8283051B2Plated product having copper thin film formed thereon by electroless platingITO JUNICHI·Filed 2009·Granted Oct 9, 2012·1 cites·5 claims
- 0757US9845528B2Tantalum sputtering targetFUKUSHIMA ATSUSHI·Filed 2010·Granted Dec 19, 2017·0 cites·18 claims
- 0854US11939647B2Tungsten targetJX NIPPON MINING & METALS CORP·Filed 2018·Granted Mar 26, 2024·0 cites·7 claims
- 0948US9890452B2Tantalum sputtering target, method for manufacturing same, and barrier film for semiconductor wiring formed by using targetJX NIPPON MINING & METALS CORP·Filed 2013·Granted Feb 13, 2018·0 cites·2 claims
- 1046US10570505B2Tantalum sputtering target, and production method thereforJX NIPPON MINING & METALS CORP·Filed 2016·Granted Feb 25, 2020·0 cites·7 claims
- 1146US2013098759A1Tantalum Sputtering TargetSENDA SHINICHIRO·Filed 2011·Application pending·0 cites
- 1244US10407766B2Tantalum sputtering target and method for producing sameJX NIPPON MINING & METALS CORP·Filed 2013·Granted Sep 10, 2019·0 cites·9 claims
- 1342US10490393B2Tantalum sputtering target and method for producing sameJX NIPPON MINING & METALS CORP·Filed 2013·Granted Nov 26, 2019·0 cites·8 claims
- 1442US2012037501A1Tantalum Sputtering TargetFUKUSHIMA ATSUSHI·Filed 2010·Application pending·0 cites
- 1539US2014242401A1Tantalum Sputtering Target and Method for Manufacturing SameJX NIPPON MINING & METALS CORP·Filed 2012·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →