Inventor · disambiguated record
Jeng-Horng Chen
Also filed as: CHEN JENG H · CHEN JENG-HORNG
136 granted patents·3 pending applications·3,116 citations·filing 1997–2022
99Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD81TAIWAN SEMICONDUCTOR MFG46WANG HUNG-CHUN5CHEN CHENG-HUNG2CHEN PEI-SHIANG2
Top patents by PatentIndex Score
139 records- 0199US9618837B2Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Apr 11, 2017·129 cites·20 claims
- 0299US9184054B1Method for integrated circuit patterningTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Nov 10, 2015·786 cites·20 claims
- 0398US10018920B2Lithography patterning with a gas phase resistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jul 10, 2018·417 cites·20 claims
- 0498US9823585B2EUV focus monitoring systems and methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Nov 21, 2017·28 cites·20 claims
- 0598US9570302B1Method of patterning a material layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Feb 14, 2017·419 cites·20 claims
- 0698US9256123B2Method of making an extreme ultraviolet pellicleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Feb 9, 2016·365 cites·20 claims
- 0797US10459352B2Mask cleaningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Oct 29, 2019·10 cites·20 claims
- 0897US9625824B2Extreme ultraviolet lithography collector contamination reductionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Apr 18, 2017·30 cites·20 claims
- 0997US9305799B2Method and system for E-beam lithography with multi-exposureTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Apr 5, 2016·26 cites·20 claims
- 1097US8791024B1Method to define multiple layer patterns using a single exposureTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jul 29, 2014·31 cites·27 claims
- 1197US8601407B2Geometric pattern data quality verification for maskless lithographyWANG HUNG-CHUN·Filed 2011·Granted Dec 3, 2013·31 cites·20 claims
- 1297US8507159B2Electron beam data storage system and method for high volume manufacturingWANG HUNG-CHUN·Filed 2011·Granted Aug 13, 2013·29 cites·16 claims
- 1397US8473877B2Striping methodology for maskless lithographyWANG HUNG-CHUN·Filed 2011·Granted Jun 25, 2013·26 cites·20 claims
- 1496US9488905B2Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Nov 8, 2016·6 cites·20 claims
- 1596US8945803B2Smart subfield method for E-beam lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Feb 3, 2015·26 cites·20 claims
- 1696US8841049B2Electron beam data storage system and method for high volume manufacturingTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 23, 2014·28 cites·20 claims
- 1796US8468473B1Method for high volume e-beam lithographyWANG HUNG-CHUN·Filed 2012·Granted Jun 18, 2013·34 cites·20 claims
- 1896US8464186B2Providing electron beam proximity effect correction by simulating write operations of polygonal shapesWANG HUNG-CHUN·Filed 2011·Granted Jun 11, 2013·29 cites·20 claims
- 1995US9678431B2EUV lithography system and method with optimized throughput and stabilityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jun 13, 2017·6 cites·20 claims
- 2095US8835082B2Method and system for E-beam lithography with multi-exposureCHEN PEI-SHIANG·Filed 2012·Granted Sep 16, 2014·28 cites·20 claims
- 2195US8609308B1Smart subfield method for E-beam lithographyCHEN PEI-SHIANG·Filed 2012·Granted Dec 17, 2013·31 cites·20 claims
- 2295US8563224B1Data process for E-beam lithographyCHEN CHENG-HUNG·Filed 2012·Granted Oct 22, 2013·28 cites·20 claims
- 2394US8987689B2Efficient scan for E-beam lithographyCHEN CHENG-HUNG·Filed 2012·Granted Mar 24, 2015·19 cites·20 claims
- 2493US10534256B2Pellicle assembly and method for advanced lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jan 14, 2020·6 cites·19 claims
- 2593US9759997B2Pellicle assembly and method for advanced lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Sep 12, 2017·7 cites·20 claims
- 2693US6982135B2Pattern compensation for stitchingTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Jan 3, 2006·54 cites·18 claims
- 2792US8677511B2Apparatus for charged particle lithography systemWANG SHIH-CHI·Filed 2012·Granted Mar 18, 2014·28 cites·20 claims
- 2892US6118185ASegmented box-in-box for improving back end overlay measurementTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted Sep 12, 2000·80 cites·4 claims
- 2990US11294274B2Pellicle assembly and method for advanced lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 5, 2022·2 cites·19 claims
- 3090US10459353B2Lithography system with an embedded cleaning moduleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Oct 29, 2019·5 cites·20 claims
- 3190US10031411B2Pellicle for EUV mask and fabrication thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jul 24, 2018·3 cites·20 claims
- 3290US9261774B2Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensityTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Feb 16, 2016·4 cites·20 claims
- 3390US9081312B2Method to define multiple layer patterns with a single exposure by E-beam lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jul 14, 2015·7 cites·22 claims
- 3489US10276372B2Method for integrated circuit patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 30, 2019·4 cites·20 claims
- 3589US7078351B2Photoresist intensive patterning and processingTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Jul 18, 2006·44 cites·7 claims
- 3688US9664999B2Method of making an extreme ultraviolet pellicleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted May 30, 2017·2 cites·20 claims
- 3788US7851774B2System and method for direct writing to a waferTAIWAN SEMICONDUCTOR MFG·Filed 2008·Granted Dec 14, 2010·9 cites·20 claims
- 3887US10162257B2Extreme ultraviolet lithography system, device, and method for printing low pattern density featuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 25, 2018·2 cites·20 claims
- 3986US9964850B2Method to mitigate defect printability for ID patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted May 8, 2018·3 cites·20 claims
- 4086US9535334B2Extreme ultraviolet lithography process to print low pattern density featuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jan 3, 2017·4 cites·19 claims
- 4185US10007174B2Extreme ultraviolet lithography process and maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 26, 2018·2 cites·20 claims
- 4285US9140987B2Method for lithography patterningTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Sep 22, 2015·7 cites·20 claims
- 4384US9690186B2Extreme ultraviolet lithography process and maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jun 27, 2017·2 cites·20 claims
- 4484US9665007B2Rotary EUV collectorTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted May 30, 2017·2 cites·20 claims
- 4584US9588419B2Extreme ultraviolet light (EUV) photomasks and fabrication methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Mar 7, 2017·2 cites·20 claims
- 4684US9316900B2Extreme ultraviolet lithography process and maskTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Apr 19, 2016·3 cites·22 claims
- 4783US11921434B2Mask cleaningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Mar 5, 2024·0 cites·20 claims
- 4883US11003069B2High durability extreme ultraviolet photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 11, 2021·1 cites·20 claims
- 4983US9442384B2Extreme ultraviolet lithography process and maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Sep 13, 2016·3 cites·20 claims
- 5083US9134604B2Extreme ultraviolet (EUV) mask and method of fabricating the EUV maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Sep 15, 2015·3 cites·20 claims
Showing the top 50 of 139 patent records by PatentIndex Score.
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