Inventor · disambiguated record
Ting-Ya Cheng
Also filed as: CHENG TING-YA
8 granted patents·2 pending applications·9 citations·filing 2019–2025
81Inventor score
Technology areasH05G
Files withTAIWAN SEMICONDUCTOR MFG CO LTD10
Top patents by PatentIndex Score
10 records- 0194US11860544B2Target control in extreme ultraviolet lithography systems using aberration of reflection imageTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 2, 2024·2 cites·20 claims
- 0294US11340531B2Target control in extreme ultraviolet lithography systems using aberration of reflection imageTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 24, 2022·3 cites·20 claims
- 0389US11800626B2Shock wave visualization for extreme ultraviolet plasma optimizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 24, 2023·1 cites·20 claims
- 0486US11452197B2Shock wave visualization for extreme ultraviolet plasma optimizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Sep 20, 2022·2 cites·20 claims
- 0581US12332571B2Target control in extreme ultraviolet lithography systems using aberration of reflection imageTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jun 17, 2025·0 cites·20 claims
- 0681US2025271769A1Target control in extreme ultraviolet lithography systems using aberration of reflection imageTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0778US12114412B2Shock wave visualization for extreme ultraviolet plasma optimizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Oct 8, 2024·0 cites·20 claims
- 0878US11212903B2Apparatus and method for generating extreme ultraviolet radiationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 28, 2021·1 cites·20 claims
- 0977US2024381515A1Apparatus and method for generating extreme ultraviolet radiationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1073US12133319B2Apparatus and method for generating extreme ultraviolet radiationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Oct 29, 2024·0 cites·20 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →