Inventor · disambiguated record
Ming-Ho Tsai
Also filed as: TSAI MING-HO
8 granted patents·2 pending applications·135 citations·filing 2011–2025
83Inventor score
Top patents by PatentIndex Score
10 records- 0196US9230867B2Structure and method for E-beam in-chip overlay markTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Jan 5, 2016·65 cites·20 claims
- 0295US12021050B2Semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jun 25, 2024·2 cites·20 claims
- 0394US8736084B2Structure and method for E-beam in-chip overlay markCHENG DONG-HSU·Filed 2011·Granted May 27, 2014·67 cites·20 claims
- 0486US2025316630A1Semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0584US12400987B2Semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Aug 26, 2025·0 cites·20 claims
- 0673US10274817B2Mask and photolithography systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 30, 2019·1 cites·13 claims
- 0760US11469198B2Semiconductor device manufacturing method and associated semiconductor dieTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Oct 11, 2022·0 cites·20 claims
- 0856US11262658B2Photomask, photolithography system and manufacturing processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Mar 1, 2022·0 cites·20 claims
- 0956US9081293B2System and method for lithography exposure with correction of overlay shift induced by mask heatingTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jul 14, 2015·0 cites·20 claims
- 1048US2015316861A1System and Method for Lithography Exposure With Correction of Overlay Shift Induced By Mask HeatingTAIWAN SEMICONDUCTOR MFG·Filed 2015·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →