Inventor · disambiguated record
Toyohisa Sakurada
Also filed as: SAKURADA TOYOHISA
16 granted patents·1 pending application·215 citations·filing 1992–2016
93Inventor score
Files withSHINETSU CHEMICAL CO12RES ASS FOR BIOTECHNOLOGY OF A3NEC ELECTRONICS CORP1SHIU ETSU CHEMICAL CO LTD1
Top patents by PatentIndex Score
17 records- 0192US9366951B2Halftone phase shift photomask blank, halftone phase shift photomask and pattern exposure methodSHINETSU CHEMICAL CO·Filed 2014·Granted Jun 14, 2016·8 cites·11 claims
- 0290US9645485B2Halftone phase shift photomask blank and making methodSHINETSU CHEMICAL CO·Filed 2015·Granted May 9, 2017·4 cites·4 claims
- 0387US5993843ABiodegradable sustained-release preparationRES ASS FOR BIOTECHNOLOGY OF A·Filed 1997·Granted Nov 30, 1999·59 cites·9 claims
- 0486US6511785B1Chemically amplified positive resist composition and patterning methodSHINETSU CHEMICAL CO·Filed 2000·Granted Jan 28, 2003·27 cites·17 claims
- 0579US6800551B2Chemical amplification type photoresist composition, method for producing a semiconductor device using the composition, and semiconductor substrateNEC ELECTRONICS CORP·Filed 2002·Granted Oct 5, 2004·24 cites·16 claims
- 0674US6159489ABiodegradable sustained-release preparation, biodegradable pheromone dispenser and biodegradable pest controlling agentRES ASS FOR BIOTECHNOLOGY OF A·Filed 1999·Granted Dec 12, 2000·22 cites·12 claims
- 0770US6419943B1Biodegradable sustained-release preparation, biodegradable pheromone dispenser and biodegradable pest controlling agentRES ASS FOR BIOTECHNOLOGY OF A·Filed 1999·Granted Jul 16, 2002·26 cites·9 claims
- 0868US5532421AMethod for the isomerization of cis-alkenyl compoundsSHINETSU CHEMICAL CO·Filed 1994·Granted Jul 2, 1996·11 cites·5 claims
- 0966US5364969AMethod for the stabilization of a sex pheromone compoundSHIU ETSU CHEMICAL CO LTD·Filed 1993·Granted Nov 15, 1994·11 cites·4 claims
- 1061US9488906B2Photomask blank and method for manufacturing photomask blankSHINETSU CHEMICAL CO·Filed 2014·Granted Nov 8, 2016·0 cites·29 claims
- 1159US9709885B2Photomask blank and method for manufacturing photomask blankSHINETSU CHEMICAL CO·Filed 2016·Granted Jul 18, 2017·0 cites·24 claims
- 1259US6252106B1Method for stabilizing a sex pheromone compoundSHINETSU CHEMICAL CO·Filed 1992·Granted Jun 26, 2001·6 cites·3 claims
- 1358US9400422B2Method for manufacturing photomask blankSHINETSU CHEMICAL CO·Filed 2014·Granted Jul 26, 2016·0 cites·22 claims
- 1446US6818148B1Resist composition and patterning methodSHINETSU CHEMICAL CO·Filed 1999·Granted Nov 16, 2004·10 cites·12 claims
- 1542US10585345B2Photomask blank, method for manufacturing photomask, and mask pattern formation methodSHINETSU CHEMICAL CO·Filed 2016·Granted Mar 10, 2020·0 cites·16 claims
- 1637US5234742APellicle for lithographySHINETSU CHEMICAL CO·Filed 1992·Granted Aug 10, 1993·7 cites·4 claims
- 1736US2017110355A1Substrate cleaning apparatus and method for cleaning substrate for substrate related to photomaskSHINETSU CHEMICAL CO·Filed 2016·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →