Inventor · disambiguated record
Toshihide Ieki
Also filed as: IEKI TOSHIHIDE
5 granted patents·1 pending application·160 citations·filing 2001–2007
82Inventor score
Files withTOYO SEIKAN KAISHA LTD6
Top patents by PatentIndex Score
6 records- 0192US6818310B2Silicon oxide filmTOYO SEIKAN KAISHA LTD·Filed 2002·Granted Nov 16, 2004·62 cites·13 claims
- 0291US7488683B2Chemical vapor deposited film based on a plasma CVD method and method of forming the filmTOYO SEIKAN KAISHA LTD·Filed 2004·Granted Feb 10, 2009·54 cites·14 claims
- 0388US6582778B2Method of treatment with a microwave plasmaTOYO SEIKAN KAISHA LTD·Filed 2001·Granted Jun 24, 2003·37 cites·17 claims
- 0473US7906217B2Vapor deposited film by plasma CVD methodTOYO SEIKAN KAISHA LTD·Filed 2006·Granted Mar 15, 2011·4 cites·9 claims
- 0557US7847209B2Method of forming a metal oxide film and microwave power source device used for the above methodTOYO SEIKAN KAISHA LTD·Filed 2003·Granted Dec 7, 2010·3 cites·12 claims
- 0655US2009202762A1Plastic formed article having a vapor-deposited film by a plasma cvd methodTOYO SEIKAN KAISHA LTD·Filed 2007·Application pending·0 cites
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