Inventor · disambiguated record
Andrew David Laforge
Also filed as: LAFORGE ANDREW · LaForge Andrew David
13 granted patents·4 pending applications·26 citations·filing 2014–2024
88Inventor score
Files withASML NETHERLANDS BV17
Top patents by PatentIndex Score
17 records- 0192US9357625B2Extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2014·Granted May 31, 2016·11 cites·32 claims
- 0291US11340532B2Prolonging optical element lifetime in an EUV lithography systemASML NETHERLANDS BV·Filed 2019·Granted May 24, 2022·5 cites·29 claims
- 0390US11347154B2Cleaning a structure surface in an EUV chamberASML NETHERLANDS BV·Filed 2019·Granted May 31, 2022·3 cites·21 claims
- 0487US10064261B2Extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2017·Granted Aug 28, 2018·3 cites·24 claims
- 0584US11846887B2Prolonging optical element lifetime in an EUV lithography systemASML NETHERLANDS BV·Filed 2022·Granted Dec 19, 2023·1 cites·25 claims
- 0684US2025085643A1Cleaning a structure surface in an euv chamberASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 0778US11822252B2Guiding device and associated systemASML NETHERLANDS BV·Filed 2021·Granted Nov 21, 2023·1 cites·20 claims
- 0876US12189313B2Cleaning a structure surface in an EUV chamberASML NETHERLANDS BV·Filed 2022·Granted Jan 7, 2025·0 cites·16 claims
- 0976US11874608B2Apparatus for and method of reducing contamination from source material in an EUV light sourceASML NETHERLANDS BV·Filed 2019·Granted Jan 16, 2024·1 cites·26 claims
- 1075US10349509B2Reducing the effect of plasma on an object in an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2018·Granted Jul 9, 2019·1 cites·17 claims
- 1169US2024160109A1Prolonging optical element lifetime in an euv lithography systemASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1269US2024103387A1Apparatus for and method of reducing contamination from source material in an euv light sourceASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1366US10904993B2Reducing the effect of plasma on an object in an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2019·Granted Jan 26, 2021·0 cites·20 claims
- 1463US12389519B2Guiding device and associated systemASML NETHERLANDS BV·Filed 2023·Granted Aug 12, 2025·0 cites·20 claims
- 1554US2017311429A1Reducing the effect of plasma on an object in an extreme ultraviolet light sourceASML NETHERLANDS BV·Filed 2016·Application pending·0 cites
- 1652US10955749B2Guiding device and associated systemASML NETHERLANDS BV·Filed 2018·Granted Mar 23, 2021·0 cites·20 claims
- 1746US12287455B2Oxygen-loss resistant top coating for optical elementsASML NETHERLANDS BV·Filed 2020·Granted Apr 29, 2025·0 cites·10 claims
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