Inventor · disambiguated record
Jun Iwashita
Also filed as: IWASHITA JUN
27 granted patents·14 pending applications·170 citations·filing 2002–2021
95Inventor score
Files withTOKYO OHKA KOGYO CO LTD24IWASHITA JUN5SONY SEMICONDUCTOR SOLUTIONS CORP2UTSUMI YOSHIYUKI2HIRANO TOMOYUKI1
Top patents by PatentIndex Score
41 records- 0194US7709179B2Negative resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted May 4, 2010·22 cites·11 claims
- 0293US8795948B2Resist composition, method of forming resist pattern and polymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2013·Granted Aug 5, 2014·12 cites·3 claims
- 0391US6936400B2Negative resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Aug 30, 2005·40 cites·27 claims
- 0490US9023581B2Resist composition, method of forming resist pattern, polymeric compound, and compoundKAWAUE AKIYA·Filed 2011·Granted May 5, 2015·8 cites·14 claims
- 0590US8883396B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2012·Granted Nov 11, 2014·7 cites·5 claims
- 0677US9104101B2Resist composition, method of forming resist pattern and polymeric compoundMATSUZAWA KENSUKE·Filed 2012·Granted Aug 11, 2015·4 cites·11 claims
- 0776US8034536B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2009·Granted Oct 11, 2011·4 cites·8 claims
- 0875US8778595B2Resist composition, method of forming resist pattern, and polymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2012·Granted Jul 15, 2014·2 cites·7 claims
- 0975US8043795B2Method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Oct 25, 2011·4 cites·9 claims
- 1074US7527909B2Resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted May 5, 2009·9 cites·6 claims
- 1174US6982140B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO LTD·Filed 2002·Granted Jan 3, 2006·34 cites·12 claims
- 1272US8268530B2Positive resist composition, method of forming resist pattern, polymeric compound, and compoundUTSUMI YOSHIYUKI·Filed 2010·Granted Sep 18, 2012·2 cites·12 claims
- 1368US7598017B2Negative resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Oct 6, 2009·2 cites·11 claims
- 1468US7541138B2Resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Jun 2, 2009·6 cites·3 claims
- 1567US8986919B2Resist composition, method of forming resist pattern and polymeric compoundTAKAKI DAICHI·Filed 2012·Granted Mar 24, 2015·2 cites·8 claims
- 1664US7820360B2Polymer compound, negative resist composition, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Oct 26, 2010·2 cites·8 claims
- 1762US8021824B2Polymer compound, resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Sep 20, 2011·1 cites·8 claims
- 1858US2024006840A1Light emitting device and method for manufacturing sameSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2021·Application pending·0 cites
- 1957US7501220B2Resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Mar 10, 2009·9 cites·10 claims
- 2054US2014162193A1Resist composition for euv, method of producing resist composition for euv, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2014·Application pending·0 cites
- 2153US2023194671A1Light emitting device and distance measuring deviceSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2021·Application pending·0 cites
- 2248US7939243B2Resin, resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted May 10, 2011·0 cites·13 claims
- 2346US8232040B2Positive resist composition and method of forming resist patternIWASHITA JUN·Filed 2009·Granted Jul 31, 2012·0 cites·15 claims
- 2446US2012208124A1Resist composition for euv, method for producing resist composition for euv, and method of forming resist patternIWASHITA JUN·Filed 2012·Application pending·0 cites
- 2544US9057948B2Resist composition for EUV or EB, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2012·Granted Jun 16, 2015·0 cites·5 claims
- 2643US9097971B2Compound, radical polymerization initiator, method for producing compound, polymer, resist composition, and method for forming resist patternUTSUMI YOSHIYUKI·Filed 2012·Granted Aug 4, 2015·0 cites·4 claims
- 2743US8574809B2Positive resist composition and method of forming resist patternMIMURA TAKEYOSHI·Filed 2009·Granted Nov 5, 2013·0 cites·12 claims
- 2843US2014093824A1Resist composition for euv or eb and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2013·Application pending·0 cites
- 2943US2010248144A1Positive resist composition, method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2010·Application pending·0 cites
- 3042US2009142693A1Negative resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Application pending·0 cites
- 3142US2014186769A1Resist composition, method for forming resist pattern, and high-molecular weight compoundTOKYO OHKA KOGYO CO LTD·Filed 2013·Application pending·0 cites
- 3242US2009098489A1Method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2005·Application pending·0 cites
- 3342US2013095427A1Resist composition for euv or eb and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2012·Application pending·0 cites
- 3442US2009305163A1Negative resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2005·Application pending·0 cites
- 3539US2013337387A1Resist composition and method of forming resist patternTOKYO OHTA KOGYO CO LTD·Filed 2013·Application pending·0 cites
- 3639US2012100487A1Resist composition, method of forming resist pattern, and polymeric compoundHIRANO TOMOYUKI·Filed 2011·Application pending·0 cites
- 3737US9618843B2Resist composition and method of forming resist patternIWASHITA JUN·Filed 2012·Granted Apr 11, 2017·0 cites·6 claims
- 3836US2013071789A1Resist composition and method of forming resist patternIWASHITA JUN·Filed 2012·Application pending·0 cites
- 3934US8586281B2Positive resist composition and method of forming resist patternIWASHITA JUN·Filed 2011·Granted Nov 19, 2013·0 cites·3 claims
- 4033US8198004B2Resist compositionHIRAYAMA TAKU·Filed 2008·Granted Jun 12, 2012·0 cites·2 claims
- 4125US7582409B2Negative resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Sep 1, 2009·0 cites·6 claims
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