Inventor · disambiguated record
Andrew Duvall
Also filed as: DUVALL ANDREW · DUVALL ANDREW KENICHI
9 granted patents·1 pending application·401 citations·filing 2014–2020
86Inventor score
Files withLAM RES CORP10
Top patents by PatentIndex Score
10 records- 0197US9758868B1Plasma suppression behind a showerhead through the use of increased pressureLAM RES CORP·Filed 2016·Granted Sep 12, 2017·24 cites·13 claims
- 0297US9428833B1Method and apparatus for backside deposition reduction by control of wafer support to achieve edge sealLAM RES CORP·Filed 2015·Granted Aug 30, 2016·353 cites·15 claims
- 0396US10665429B2Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformityLAM RES CORP·Filed 2017·Granted May 26, 2020·6 cites·20 claims
- 0496US9793096B2Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformityLAM RES CORP·Filed 2015·Granted Oct 17, 2017·16 cites·18 claims
- 0579US10622243B2Planar substrate edge contact with open volume equalization pathways and side containmentLAM RES CORP·Filed 2017·Granted Apr 14, 2020·2 cites·19 claims
- 0669US11127567B2Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformityLAM RES CORP·Filed 2020·Granted Sep 21, 2021·0 cites·24 claims
- 0763US11443975B2Planar substrate edge contact with open volume equalization pathways and side containmentLAM RES CORP·Filed 2020·Granted Sep 13, 2022·0 cites·24 claims
- 0858US10648079B2Reducing backside deposition at wafer edgeLAM RES CORP·Filed 2014·Granted May 12, 2020·0 cites·18 claims
- 0944US9970108B2Systems and methods for vapor delivery in a substrate processing systemLAM RES CORP·Filed 2015·Granted May 15, 2018·0 cites·19 claims
- 1044US2016056032A1Methods and apparatuses for stable deposition rate control in low temperature ald systems by showerhead active heating and/or pedestal coolingLAM RES CORP·Filed 2014·Application pending·0 cites
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