Inventor · disambiguated record
Susan Clay Vitkavage
Also filed as: VITKAVAGE SUSAN · VITKAVAGE SUSAN C · VITKAVAGE SUSAN CLAY
16 granted patents·419 citations·filing 1991–2008
95Inventor score
Top patents by PatentIndex Score
16 records- 0196US7068139B2Inductor formed in an integrated circuitAGERE SYSTEMS INC·Filed 2004·Granted Jun 27, 2006·66 cites·18 claims
- 0283US6083810AIntegrated circuit fabrication processLUCENT TECHNOLOGIES INC·Filed 1996·Granted Jul 4, 2000·73 cites·9 claims
- 0381US6432814B1Method of manufacturing an interconnect structure having a passivation layer for preventing subsequent processing reactionsAGERE SYST GUARDIAN CORP·Filed 2000·Granted Aug 13, 2002·31 cites·20 claims
- 0480US6879046B2Split barrier layer including nitrogen-containing portion and oxygen-containing portionAGERE SYSTEMS INC·Filed 2002·Granted Apr 12, 2005·22 cites·13 claims
- 0578US6798043B2Structure and method for isolating porous low-k dielectric filmsAGERE SYSTEMS INC·Filed 2002·Granted Sep 28, 2004·22 cites·18 claims
- 0678US5858873AIntegrated circuit having amorphous silicide layer in contacts and vias and method of manufacture thereofLUCENT TECHNOLOGIES INC·Filed 1997·Granted Jan 12, 1999·45 cites·7 claims
- 0774US6548892B1Low k dielectric insulator and method of forming semiconductor circuit structuresAGERE SYSTEMS INC·Filed 2000·Granted Apr 15, 2003·16 cites·30 claims
- 0872US6028359AIntegrated circuit having amorphous silicide layer in contacts and vias and method of manufacture thereforLUCENT TECHNOLOGIES INC·Filed 1998·Granted Feb 22, 2000·34 cites·21 claims
- 0968US7678639B2Inductor formed in an integrated circuitAGERE SYSTEMS INC·Filed 2008·Granted Mar 16, 2010·3 cites·6 claims
- 1064US7541238B2Inductor formed in an integrated circuitAGERE SYSTEMS INC·Filed 2006·Granted Jun 2, 2009·2 cites·10 claims
- 1162US6657302B1Integration of low dielectric material in semiconductor circuit structuresAGERE SYSTEMS INC·Filed 1999·Granted Dec 2, 2003·29 cites·33 claims
- 1254US6576980B1Surface treatment anneal of hydrogenated silicon-oxy-carbide dielectric layerAGERE SYSTEMS INC·Filed 1999·Granted Jun 10, 2003·20 cites·14 claims
- 1352US5607543AIntegrated circuit etchingLUCENT TECHNOLOGIES INC·Filed 1995·Granted Mar 4, 1997·20 cites·7 claims
- 1450US6214732B1Chemical mechanical polishing endpoint detection by monitoring component activity in effluent slurryLUCENT TECHNOLOGIES INC·Filed 1999·Granted Apr 10, 2001·15 cites·21 claims
- 1548US6258231B1Chemical mechanical polishing endpoint apparatus using component activity in effluent slurryAGERE SYST GUARDIAN CORP·Filed 1999·Granted Jul 10, 2001·12 cites·19 claims
- 1641US5244821ABipolar fabrication methodAT & T BELL LAB·Filed 1991·Granted Sep 14, 1993·9 cites·15 claims
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