Inventor · disambiguated record
Justin Kreuzer
Also filed as: KREUZER JUSTIN · KREUZER JUSTIN L · KREUZER JUSTIN LLOYD
62 granted patents·8 pending applications·1,028 citations·filing 1980–2025
99Inventor score
Files withASML HOLDING NV42ASML NETHERLANDS BV14PERKIN ELMER CORP4SVG LITHOGRAPHY SYSTEMS INC3ZYGO CORP3
Top patents by PatentIndex Score
70 records- 0196US7445883B2Lithographic printing with polarized lightASML HOLDING NV·Filed 2006·Granted Nov 4, 2008·46 cites·19 claims
- 0296US7112813B2Device inspection method and apparatus using an asymmetric markerASML NETHERLANDS BV·Filed 2003·Granted Sep 26, 2006·61 cites·64 claims
- 0396US6628406B1Self referencing mark independent alignment sensorFiled 2000·Granted Sep 30, 2003·63 cites·29 claims
- 0496US6522483B2Optical reduction system with elimination of reticle diffraction induced biasSILICON VALLEY GROUP·Filed 2001·Granted Feb 18, 2003·57 cites·30 claims
- 0595US6680798B2Optical reduction system with control of illumination polarizationASML HOLDING NV·Filed 2001·Granted Jan 20, 2004·65 cites·8 claims
- 0694US9970747B2Position measurement with illumination profile having two diametrically opposed off-axis radiationASML NETHERLANDS BV·Filed 2017·Granted May 15, 2018·5 cites·20 claims
- 0794US5757160AMoving interferometer wafer stageSVG LITHOGRAPHY SYSTEMS INC·Filed 1996·Granted May 26, 1998·152 cites·19 claims
- 0893US7239446B2Optical reduction system with control of illumination polarizationASML HOLDING NV·Filed 2003·Granted Jul 3, 2007·39 cites·13 claims
- 0993US7031077B2Optical reduction method with elimination of reticle diffraction induced biasASML HOLDING NV·Filed 2004·Granted Apr 18, 2006·37 cites·7 claims
- 1092US7133121B2Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap regionASML HOLDING NV·Filed 2005·Granted Nov 7, 2006·13 cites·10 claims
- 1192US5559601AMask and wafer diffraction grating alignment system wherein the diffracted light beams return substantially along an incident angleSVG LITHOGRAPHY SYSTEMS INC·Filed 1995·Granted Sep 24, 1996·104 cites·5 claims
- 1291US6360012B1In situ projection optic metrology method and apparatusSVG LITHOGRAPHY SYSTEMS INC·Filed 1999·Granted Mar 19, 2002·80 cites·26 claims
- 1390US12124177B2Overlay measurement system using lock-in amplifier techniqueASML HOLDING NV·Filed 2020·Granted Oct 22, 2024·2 cites·21 claims
- 1490US9605947B2Position measurement with illumination profile having regions confined to peripheral portion of pupilASML HOLDING NV·Filed 2013·Granted Mar 28, 2017·10 cites·19 claims
- 1590US6876440B1Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap regionASML HOLDING NV·Filed 2003·Granted Apr 5, 2005·22 cites·15 claims
- 1690US6836380B2Optical reduction system with elimination of reticle diffraction induced biasASML HOLDING NV·Filed 2003·Granted Dec 28, 2004·27 cites·10 claims
- 1789US6778258B2Wafer handling system for use in lithography patterningASML HOLDING NV·Filed 2001·Granted Aug 17, 2004·35 cites·28 claims
- 1887US11175593B2Alignment sensor apparatus for process sensitivity compensationASML NETHERLANDS BV·Filed 2019·Granted Nov 16, 2021·4 cites·38 claims
- 1986US6809827B2Self referencing mark independent alignment sensorASML HOLDING NV·Filed 2003·Granted Oct 26, 2004·19 cites·7 claims
- 2084US12298257B2Monolithic particle inspection deviceASML NETHERLANDS BV·Filed 2021·Granted May 13, 2025·1 cites·13 claims
- 2184US6917432B2Interferometers for measuring changes in optical beam directionZYGO CORP·Filed 2002·Granted Jul 12, 2005·24 cites·20 claims
- 2282US11994808B2Lithographic apparatus, metrology systems, phased array illumination sources and methods thereofASML HOLDING NV·Filed 2020·Granted May 28, 2024·1 cites·24 claims
- 2382US9551939B2Mark position measuring apparatus and method, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Jan 24, 2017·6 cites·20 claims
- 2482US7511826B2Symmetrical illumination forming system and methodASML HOLDING NV·Filed 2006·Granted Mar 31, 2009·6 cites·20 claims
- 2580US4335313AMethod and apparatus for aligning an opaque mask with an integrated circuit waferPERKIN ELMER CORP·Filed 1980·Granted Jun 15, 1982·31 cites·13 claims
- 2680US2025314958A1Contaminant identification metrology system, lithographic apparatus, and methods thereofASML HOLDING NV·Filed 2025·Application pending·0 cites
- 2779US11526091B2Sensor apparatus and method for lithographic measurementsASML HOLDING NV·Filed 2020·Granted Dec 13, 2022·1 cites·20 claims
- 2879US10488767B2Alignment system wafer stack beam analyzerASML HOLDING NV·Filed 2017·Granted Nov 26, 2019·2 cites·20 claims
- 2979US7090964B2Lithographic printing with polarized lightASML HOLDING NV·Filed 2004·Granted Aug 15, 2006·18 cites·29 claims
- 3078US7751030B2Interferometric lithographic projection apparatusASML HOLDING NV·Filed 2006·Granted Jul 6, 2010·5 cites·25 claims
- 3176US7084987B2Method and system to interferometrically detect an alignment markASML HOLDINGS N V·Filed 2004·Granted Aug 1, 2006·10 cites·16 claims
- 3275US11531280B2Compact alignment sensor arrangementsASML HOLDING NV·Filed 2019·Granted Dec 20, 2022·1 cites·18 claims
- 3375US6859260B2Method and system for improving focus accuracy in a lithography systemASML HOLDING NV·Filed 2001·Granted Feb 22, 2005·12 cites·51 claims
- 3474US9927726B2Polarization independent interferometerASML NETHERLANDS BV·Filed 2014·Granted Mar 27, 2018·3 cites·17 claims
- 3574US7898646B2Using an interferometer as a high speed variable attenuatorASML NETHERLANDS BV·Filed 2007·Granted Mar 1, 2011·3 cites·3 claims
- 3674US7053984B2Method and systems for improving focus accuracy in a lithography systemASML HOLDING NV·Filed 2005·Granted May 30, 2006·3 cites·17 claims
- 3771US11662198B2Optical arrangement for an inspection apparatusASML HOLDING NV·Filed 2018·Granted May 30, 2023·1 cites·20 claims
- 3866US4534047AMask ring assembly for X-ray lithographyPERKIN ELMER CORP·Filed 1984·Granted Aug 6, 1985·18 cites·11 claims
- 3965US12379655B2Contaminant identification metrology system, lithographic apparatus, and methods thereofASML HOLDING NV·Filed 2021·Granted Aug 5, 2025·0 cites·17 claims
- 4065US7180573B2System and method to block unwanted light reflecting from a pattern generating portion from reaching an objectASML HOLDING NV·Filed 2004·Granted Feb 20, 2007·6 cites·27 claims
- 4164US8089609B2Lithographic apparatus and device manufacturing methodSEWELL HARRY·Filed 2008·Granted Jan 3, 2012·1 cites·20 claims
- 4264US2025296128A1Method and apparatus for particle removalASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 4363US7248336B2Method and system for improving focus accuracy in a lithography systemASML HOLDING NV·Filed 2006·Granted Jul 24, 2007·1 cites·20 claims
- 4462US12135505B2Spectrometric metrology systems based on multimode interference and lithographic apparatusASML HOLDING NV·Filed 2021·Granted Nov 5, 2024·0 cites·20 claims
- 4562US10558131B2Polarization independent metrology systemASML HOLDING NV·Filed 2019·Granted Feb 11, 2020·0 cites·20 claims
- 4662US6927842B2Wafer handling method for use in lithography patterningASML HOLDING NV·Filed 2004·Granted Aug 9, 2005·5 cites·14 claims
- 4761US12216414B2Self-referencing integrated alignment sensorASML HOLDING NV·Filed 2021·Granted Feb 4, 2025·0 cites·20 claims
- 4860US12405535B2Method for filtering an image and associated metrology apparatusASML HOLDING NV·Filed 2020·Granted Sep 2, 2025·0 cites·15 claims
- 4960US12399000B2Systems and methods for measuring intensity in a lithographic alignment apparatusASML HOLDING NV·Filed 2022·Granted Aug 26, 2025·0 cites·20 claims
- 5059US11841628B2Apparatus for and method of sensing alignment marksASML HOLDING NV·Filed 2021·Granted Dec 12, 2023·0 cites·20 claims
Showing the top 50 of 70 patent records by PatentIndex Score.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →