P

Inventor

KOBAYASHI MASAKAZU

JP145 patents
⚠️ This page may combine multiple inventors who share the name “KOBAYASHI MASAKAZU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO OHKA KOGYO CO LTD

21 patents
US5795702AAug 18, 1998

Photoresist stripping liquid compositions and a method of stripping photoresists using the same

TOKYO OHKA KOGYO CO LTD165 citations99
US5792274AAug 11, 1998

Remover solution composition for resist and method for removing resist using the same

TOKYO OHKA KOGYO CO LTD121 citations99
US5968848AOct 19, 1999

Process for treating a lithographic substrate and a rinse solution for the treatment

TOKYO OHKA KOGYO CO LTD97 citations98
US6638899B1Oct 28, 2003

Photoresist stripping solution and a method of stripping photoresists with the same

TOKYO OHKA KOGYO CO LTD62 citations96
US6261745B1Jul 17, 2001

Post-ashing treating liquid compositions and a process for treatment therewith

TOKYO OHKA KOGYO CO LTD71 citations96
US6068000AMay 30, 2000

Substrate treatment method

TOKYO OHKA KOGYO CO LTD62 citations96
US5905063AMay 18, 1999

Remover solution composition for resist and method for removing resist using the same

TOKYO OHKA KOGYO CO LTD81 citations96
US5863710AJan 26, 1999

Developer solution for photolithographic patterning

TOKYO OHKA KOGYO CO LTD56 citations96
US4824762AApr 25, 1989

Method for rinse treatment of a substrate

TOKYO OHKA KOGYO CO LTD55 citations96
US6268108B1Jul 31, 2001

Composition for forming antireflective coating film and method for forming resist pattern using same

TOKYO OHKA KOGYO CO LTD40 citations93
US6136505AOct 24, 2000

Liquid coating composition for use in forming antireflective film and photoresist material using said antireflective film

TOKYO OHKA KOGYO CO LTD21 citations93
US5783362AJul 21, 1998

Liquid coating composition for use in forming photoresist coating films and a photoresist material using said composition

TOKYO OHKA KOGYO CO LTD27 citations93
US5631314AMay 20, 1997

Liquid coating composition for use in forming photoresist coating films and photoresist material using said composition

TOKYO OHKA KOGYO CO LTD36 citations93
US5368783ANov 29, 1994

Negative-working radiation-sensitive resist composition

TOKYO OHKA KOGYO CO LTD32 citations93
US4944893AJul 31, 1990

Remover solution for resist

TOKYO OHKA KOGYO CO LTD32 citations93
US6291142B1Sep 18, 2001

Photoresist stripping liquid compositions and a method of stripping photoresists using the same

TOKYO OHKA KOGYO CO LTD17 citations92
US6284428B1Sep 4, 2001

Undercoating composition for photolithographic resist

TOKYO OHKA KOGYO CO LTD29 citations92
US6225034B1May 1, 2001

Photoresist stripping liquid compositions and a method of stripping photoresists using the same

TOKYO OHKA KOGYO CO LTD20 citations92
US6225030B1May 1, 2001

Post-ashing treating method for substrates

TOKYO OHKA KOGYO CO LTD22 citations92
US6218087B1Apr 17, 2001

Photoresist stripping liquid composition and a method of stripping photoresists using the same

TOKYO OHKA KOGYO CO LTD23 citations92
US4844832AJul 4, 1989

Containing an arylsulfonic acid, a phenol and a naphalenic solvent

TOKYO OHKA KOGYO CO LTD31 citations92

NGK INSULATORS LTD

7 patents

NISSAN MOTOR

4 patents

FUJISAWA PHARMACEUTICAL CO

4 patents

HITACHI LTD

2 patents

ALPS ELECTRIC CO LTD

2 patents

FUJITSU LTD

2 patents

NIPPON COLUMBIA

1 patent

ROHM CO LTD

1 patent

SHIMADZU CORP

1 patent

JAPAN AVIATION ELECTRONICS IND LTD

1 patent

SHARP KK

1 patent

KYOWA VACUUM ENG

1 patent

SHOWA DENKO KK

1 patent

TOKYO OHIKA KOGYO CO LTD

1 patent

Showing the top 50 of 145 patents by PatentIndex Score.