Inventor · disambiguated record
Osamu Ikenaga
Also filed as: IKENAGA OSAMU
15 granted patents·6 pending applications·227 citations·filing 1983–2011
93Inventor score
Top patents by PatentIndex Score
21 records- 0186US6649310B2Method of manufacturing photomaskTOSHIBA KK·Filed 2001·Granted Nov 18, 2003·26 cites·60 claims
- 0284US4878177AMethod for drawing a desired circuit pattern using charged particle beamTOSHIBA KK·Filed 1988·Granted Oct 31, 1989·32 cites·7 claims
- 0383US7735055B2Method of creating photo mask data, method of photo mask manufacturing, and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2005·Granted Jun 8, 2010·8 cites·4 claims
- 0480US4989156AMethod of drawing a pattern on wafer with charged beamTOSHIBA KK·Filed 1990·Granted Jan 29, 1991·40 cites·3 claims
- 0575US7742162B2Mask defect inspection data generating method, mask defect inspection method and mask production methodTOSHIBA KK·Filed 2008·Granted Jun 22, 2010·5 cites·14 claims
- 0675US4623256AApparatus for inspecting mask used for manufacturing integrated circuitsTOSHIBA KK·Filed 1984·Granted Nov 18, 1986·41 cites·4 claims
- 0773US4701053AMark position detecting method and apparatusTOKYO SHIBAURA ELECTRIC CO·Filed 1983·Granted Oct 20, 1987·24 cites·23 claims
- 0871US7090949B2Method of manufacturing a photo mask and method of manufacturing a semiconductor deviceTOSHIBA KK·Filed 2003·Granted Aug 15, 2006·14 cites·16 claims
- 0970US8036446B2Semiconductor mask inspection using die-to-die and die-to-database comparisonsTOSHIBA KK·Filed 2006·Granted Oct 11, 2011·3 cites·20 claims
- 1068US6333213B2Method of forming photomask and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2000·Granted Dec 25, 2001·13 cites·38 claims
- 1166US8121387B2Mask pattern verifying methodASANO MITSUYO·Filed 2008·Granted Feb 21, 2012·5 cites·15 claims
- 1264US7008731B2Method of manufacturing a photomask and method of manufacturing a semiconductor device using the photomaskTOSHIBA KK·Filed 2003·Granted Mar 7, 2006·7 cites·14 claims
- 1361US7229721B2Method for evaluating photo mask and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2003·Granted Jun 12, 2007·6 cites·20 claims
- 1457US2003074274A1Mask trading system and methodFiled 2002·Application pending·0 cites
- 1556US7222327B2Photo mask, method of manufacturing photo mask, and method of generating mask dataTOSHIBA KK·Filed 2004·Granted May 22, 2007·3 cites·19 claims
- 1651US7912275B2Method of evaluating a photo mask and method of manufacturing a semiconductor deviceTOSHIBA KK·Filed 2009·Granted Mar 22, 2011·0 cites·13 claims
- 1747US2009162758A1Photomask having code pattern formed by coding data conversion process information, photomask formation method, and semiconductor device fabrication methodIKENAGA OSAMU·Filed 2008·Application pending·0 cites
- 1843US2007207393A1Photomask formation method, photomask, and semiconductor device fabrication methodIKENAGA OSAMU·Filed 2007·Application pending·0 cites
- 1940US2006206853A1Method of producing mask inspection data, method of manufacturing a photo mask and method of manufacturing a semiconductor deviceKAMO TAKASHI·Filed 2006·Application pending·0 cites
- 2035US2006190875A1Pattern extracting system, method for extracting measuring points, method for extracting patterns, and computer program product for extracting patternsARISAWA YUKIYASU·Filed 2006·Application pending·0 cites
- 2133US2012049396A1Pattern forming method and pattern forming deviceTSUTSUI TOMOHIRO·Filed 2011·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →