Inventor · disambiguated record
Masahiko Okumura
Also filed as: OKUMURA MASAHIKO
18 granted patents·6 pending applications·1,141 citations·filing 1994–2011
95Inventor score
Top patents by PatentIndex Score
24 records- 0197US6122036AProjection exposure apparatus and methodNIKON CORP·Filed 1998·Granted Sep 19, 2000·624 cites·32 claims
- 0296US6400445B2Method and apparatus for positioning substrateNIKON CORP·Filed 2001·Granted Jun 4, 2002·87 cites·14 claims
- 0394US6225012B1Method for positioning substrateNIKON CORP·Filed 2000·Granted May 1, 2001·57 cites·32 claims
- 0492US5985495AMethods for measuring image-formation characteristics of a projection-optical systemNIKON CORP·Filed 1997·Granted Nov 16, 1999·110 cites·10 claims
- 0589US5654553AProjection exposure apparatus having an alignment sensor for aligning a mask image with a substrateNIKON CORP·Filed 1996·Granted Aug 5, 1997·81 cites·31 claims
- 0683US6624433B2Method and apparatus for positioning substrate and the likeNIKON CORP·Filed 1999·Granted Sep 23, 2003·50 cites·30 claims
- 0781US7068350B2Exposure apparatus and stage device, and device manufacturing methodNIKON CORP·Filed 2003·Granted Jun 27, 2006·27 cites·14 claims
- 0880US6842248B1System and method for calibrating mirrors of a stage assemblyNIKON CORP·Filed 2000·Granted Jan 11, 2005·25 cites·37 claims
- 0974US8040489B2Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquidNIKON CORP·Filed 2005·Granted Oct 18, 2011·3 cites·28 claims
- 1069US8941808B2Immersion lithographic apparatus rinsing outer contour of substrate with immersion spaceNAKANO KATSUSHI·Filed 2008·Granted Jan 27, 2015·2 cites·20 claims
- 1161US5473424ATilting apparatusNIKON CORP·Filed 1994·Granted Dec 5, 1995·32 cites·8 claims
- 1260US6141108APosition control method in exposure apparatusNIKON CORP·Filed 1999·Granted Oct 31, 2000·20 cites·23 claims
- 1351US5798530AMethod and apparatus for aligning a mask and a set of substrates to be exposedNIKON CORP·Filed 1996·Granted Aug 25, 1998·13 cites·22 claims
- 1450US2012008112A1Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquidNAKANO KATSUSHI·Filed 2011·Application pending·0 cites
- 1549US8654306B2Exposure apparatus, cleaning method, and device fabricating methodSHIRAISHI KENICHI·Filed 2009·Granted Feb 18, 2014·0 cites·38 claims
- 1648US2009097009A1Holding device and exposure apparatusNIKON CORP·Filed 2008·Application pending·0 cites
- 1744US2008137047A1Exposure apparatus and device manufacturing methodNIKON CORP·Filed 2008·Application pending·0 cites
- 1842US8780326B2Exposure apparatus, exposure method, and device manufacturing methodKIUCHI TOHRU·Filed 2006·Granted Jul 15, 2014·0 cites·20 claims
- 1942US7876452B2Interferometric position-measuring devices and methodsNIKON CORP·Filed 2008·Granted Jan 25, 2011·0 cites·39 claims
- 2042US2007242248A1Substrate processing method, exposure apparatus, and method for producing deviceNIKON CORP·Filed 2007·Application pending·0 cites
- 2141US2007188732A1Stage apparatus and exposure apparatusNIKON CORPOATION·Filed 2005·Application pending·0 cites
- 2238US8136472B2Indicator for pressure containerYAMAUCHI JUNJI·Filed 2010·Granted Mar 20, 2012·1 cites·4 claims
- 2338US5431456APipe fittingSEIKISUI CHEMICAL CO LTD·Filed 1994·Granted Jul 11, 1995·9 cites·6 claims
- 2425US2009056615A1Indicator for pressure containerYAMAUCHI JUNJI·Filed 2007·Application pending·0 cites
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