Inventor · disambiguated record
Frank Staals
Also filed as: STAALS FRANK
58 granted patents·6 pending applications·109 citations·filing 2004–2024
98Inventor score
Files withASML NETHERLANDS BV51STAALS FRANK6BURRY DAVID WARREN1DEN BOEF ARIE JEFFREY1ENGBLOM PETER DAVID1
Top patents by PatentIndex Score
64 records- 0197US11067902B2Computational metrologyASML NETHERLANDS BV·Filed 2018·Granted Jul 20, 2021·9 cites·20 claims
- 0295US10133191B2Method for determining a process window for a lithographic process, associated apparatuses and a computer programASML NETHERLANDS BV·Filed 2015·Granted Nov 20, 2018·8 cites·20 claims
- 0393US9977344B2Metrology target, method and apparatus, computer program and lithographic systemASML NETHERLANDS BV·Filed 2016·Granted May 22, 2018·5 cites·18 claims
- 0492US11422476B2Methods and apparatus for monitoring a lithographic manufacturing processASML NETHERLANDS BV·Filed 2020·Granted Aug 23, 2022·2 cites·20 claims
- 0591US11768442B2Method of determining control parameters of a device manufacturing processASML NETHERLANDS BV·Filed 2022·Granted Sep 26, 2023·1 cites·20 claims
- 0691US11487209B2Method for controlling a lithographic apparatus and associated apparatusesASML NETHERLANDS BV·Filed 2018·Granted Nov 1, 2022·3 cites·20 claims
- 0791US10571806B2Method and system to monitor a process apparatusASML NETHERLANDS BV·Filed 2017·Granted Feb 25, 2020·5 cites·22 claims
- 0890US8570492B2Lithographic apparatusVAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS·Filed 2012·Granted Oct 29, 2013·6 cites·20 claims
- 0989US9696638B2Lithographic apparatusASML NETHERLANDS BV·Filed 2015·Granted Jul 4, 2017·3 cites·18 claims
- 1088US10802408B2Method for optimization of a lithographic processASML NETHERLANDS BV·Filed 2017·Granted Oct 13, 2020·3 cites·23 claims
- 1188US10691030B2Measurement method, inspection apparatus, patterning device, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Jun 23, 2020·6 cites·20 claims
- 1287US11586114B2Wavefront optimization for tuning scanner based on performance matchingASML NETHERLANDS BV·Filed 2019·Granted Feb 21, 2023·2 cites·20 claims
- 1386US8947632B2Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrateSTAALS FRANK·Filed 2010·Granted Feb 3, 2015·5 cites·12 claims
- 1484US8554510B2Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program productSTAALS FRANK·Filed 2010·Granted Oct 8, 2013·5 cites·14 claims
- 1582US11513442B2Method of determining control parameters of a device manufacturing processASML NETHERLANDS BV·Filed 2018·Granted Nov 29, 2022·2 cites·20 claims
- 1682US11378891B2Method for determining contribution to a fingerprintASML NETHERLANDS BV·Filed 2020·Granted Jul 5, 2022·1 cites·20 claims
- 1780US12197136B2Method of determining control parameters of a device manufacturing processASML NETHERLANDS BV·Filed 2023·Granted Jan 14, 2025·0 cites·20 claims
- 1880US9958789B2Method of metrology, inspection apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted May 1, 2018·2 cites·19 claims
- 1980US8208122B2Method of measuring a lithographic projection apparatusSTAALS FRANK·Filed 2009·Granted Jun 26, 2012·7 cites·26 claims
- 2079US11029614B2Level sensor apparatus, method of measuring topographical variation across a substrate, method of measuring variation of a physical parameter related to a lithographic process, and lithographic apparatusASML NETHERLANDS BV·Filed 2017·Granted Jun 8, 2021·2 cites·20 claims
- 2179US10816904B2Method for determining contribution to a fingerprintASML NETHERLANDS BV·Filed 2018·Granted Oct 27, 2020·2 cites·26 claims
- 2279US8582082B2Method and lithographic apparatus for measuring and acquiring height data relating to a substrate surfaceSTAALS FRANK·Filed 2009·Granted Nov 12, 2013·8 cites·19 claims
- 2378US12050406B2Method for controlling a lithographic apparatus and associated apparatusesASML NETHERLANDS BV·Filed 2022·Granted Jul 30, 2024·0 cites·20 claims
- 2477US10649342B2Method and apparatus for determining a fingerprint of a performance parameterASML NETHERLANDS BV·Filed 2017·Granted May 12, 2020·2 cites·20 claims
- 2577US10571812B2Method of calibrating focus measurements, measurement method and metrology apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Feb 25, 2020·2 cites·15 claims
- 2676US11977334B2Wavefront optimization for tuning scanner based on performance matchingASML NETHERLANDS BV·Filed 2022·Granted May 7, 2024·0 cites·20 claims
- 2775US11520239B2Separation of contributions to metrology dataASML NETHERLANDS BV·Filed 2017·Granted Dec 6, 2022·1 cites·21 claims
- 2875US2024412067A1Metrology Apparatus And Method For Determining A Characteristic Of One Or More Structures On A SubstrateASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 2975US2024004299A1Method and system to monitor a process apparatusASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 3074US12461451B2Computational metrologyASML NETHERLANDS BV·Filed 2021·Granted Nov 4, 2025·0 cites·20 claims
- 3174US2023042759A1Separation of contributions to metrology dataASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 3272US11314174B2Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Apr 26, 2022·1 cites·12 claims
- 3367US9134631B2Lithographic apparatus and device manufacturing methodKUIT JAN-JAAP·Filed 2009·Granted Sep 15, 2015·2 cites·20 claims
- 3467US2022342319A1Method for determining contribution to a fingerprintASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 3566US11733610B2Method and system to monitor a process apparatusASML NETHERLANDS BV·Filed 2019·Granted Aug 22, 2023·0 cites·20 claims
- 3666US11480884B2Method for optimization of a lithographic processASML NETHERLANDS BV·Filed 2020·Granted Oct 25, 2022·0 cites·20 claims
- 3764US12346031B2Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing methodASML NETHERLANDS BV·Filed 2021·Granted Jul 1, 2025·0 cites·13 claims
- 3864US8975599B2Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatusSTAALS FRANK·Filed 2007·Granted Mar 10, 2015·1 cites·29 claims
- 3963US10871716B2Metrology robustness based on through-wavelength similarityASML NETHERLANDS BV·Filed 2019·Granted Dec 22, 2020·0 cites·21 claims
- 4062US11194258B2Method and apparatus for determining a fingerprint of a performance parameterASML NETHERLANDS BV·Filed 2020·Granted Dec 7, 2021·0 cites·20 claims
- 4161US12287582B2Method for controlling a lithographic apparatus and associated apparatusesASML NETHERLANDS BV·Filed 2020·Granted Apr 29, 2025·0 cites·20 claims
- 4261US10866527B2Methods and apparatus for monitoring a lithographic manufacturing processASML NETHERLANDS BV·Filed 2018·Granted Dec 15, 2020·0 cites·20 claims
- 4360US9229340B2Lithographic apparatusASML NETHERLANDS BV·Filed 2013·Granted Jan 5, 2016·0 cites·20 claims
- 4458US11733615B2Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing methodASML NETHERLANDS BV·Filed 2019·Granted Aug 22, 2023·0 cites·12 claims
- 4558US11385554B2Metrology apparatus and method for determining a characteristic relating to one or more structures on a substrateASML NETHERLANDS BV·Filed 2019·Granted Jul 12, 2022·0 cites·20 claims
- 4657US10394132B2Metrology robustness based on through-wavelength similarityASML NETHERLANDS BV·Filed 2017·Granted Aug 27, 2019·0 cites·20 claims
- 4757US6987555B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Jan 17, 2006·5 cites·29 claims
- 4856US7148494B2Level sensor, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Dec 12, 2006·7 cites·17 claims
- 4954US12112260B2Metrology apparatus and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2019·Granted Oct 8, 2024·0 cites·19 claims
- 5054US9329500B2Lithographic apparatus configured to reconstruct an aerial pattern and to compare the reconstructed aerial pattern with an aerial pattern detected by an image sensorSTAALS FRANK·Filed 2008·Granted May 3, 2016·0 cites·11 claims
Showing the top 50 of 64 patent records by PatentIndex Score.
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