Assignee
TOKYO EECTRON LTD
JP·1 granted patent·1 pending application·0 citations·filing 2004–2005
Top patents by PatentIndex Score
2 records- 0151US2006235558A1Method of scavenging intermediate formed by reaction of oxidoreductase with substrateTOKYO EECTRON LTD·Filed 2005·Application pending·0 cites
- 0234US7704893B2Semiconductor device, method for manufacturing semiconductor device and gas for plasma CVDTOKYO EECTRON LTD·Filed 2004·Granted Apr 27, 2010·0 cites·5 claims
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