Assignee
TAKAOKA OSAMU
JP·2 granted patents·4 pending applications·2 citations·filing 2007–2012
Top patents by PatentIndex Score
6 records- 0164US8815474B2Photomask defect correcting method and deviceTAKAOKA OSAMU·Filed 2012·Granted Aug 26, 2014·1 cites·10 claims
- 0263US8257887B2Photomask defect correcting method and deviceTAKAOKA OSAMU·Filed 2008·Granted Sep 4, 2012·1 cites·18 claims
- 0348US2008191372A1Mold inspecting method and resin residue removing method of nanoimprint lithographyTAKAOKA OSAMU·Filed 2008·Application pending·0 cites
- 0442US2008131792A1Method of Correcting Photomask DefectTAKAOKA OSAMU·Filed 2007·Application pending·0 cites
- 0541US2008107975A1Method of Correcting Photomask DefectTAKAOKA OSAMU·Filed 2007·Application pending·0 cites
- 0640US2008073522A1Method of correcting opaque defect of chrome mask, in which atomic force microscope fine working apparatus has been usedTAKAOKA OSAMU·Filed 2007·Application pending·0 cites
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