Assignee
SAITO MASATO
JP·6 granted patents·6 pending applications·4 citations·filing 2007–2012
Top patents by PatentIndex Score
12 records- 0166US8962081B2Template forming methodSAITO MASATO·Filed 2011·Granted Feb 24, 2015·1 cites·11 claims
- 0264US8995142B2Power module and method for manufacturing the sameSAITO MASATO·Filed 2010·Granted Mar 31, 2015·2 cites·11 claims
- 0359US9167825B2Method for manufacturing liquid fermented milkSAITO MASATO·Filed 2011·Granted Oct 27, 2015·0 cites·6 claims
- 0453US9238703B2Curable composition, cured product and laminateSAITO MASATO·Filed 2008·Granted Jan 19, 2016·1 cites·10 claims
- 0548US8057966B2Manufacturing method of photomask for multiple exposure and semiconductor device manufacturing method using above photomaskSAITO MASATO·Filed 2009·Granted Nov 15, 2011·0 cites·9 claims
- 0647US8279383B2Film for optical use, transparent conductive member and transparent touch panel using the sameSAITO MASATO·Filed 2007·Granted Oct 2, 2012·0 cites·9 claims
- 0745US2008213677A1Photomask manufacturing method using charged beam writing apparatusSAITO MASATO·Filed 2008·Application pending·0 cites
- 0839US2011062632A1Template with identification mark and method of manufacturing the sameSAITO MASATO·Filed 2010·Application pending·0 cites
- 0939US2011287345A1Electron beam drawing apparatus, electron beam drawing method, semiconductor device manufacturing mask manufacturing method, and semiconductor device manufacturing template manufacturing methodSAITO MASATO·Filed 2011·Application pending·0 cites
- 1039US2012267950A1Engine start control apparatusSAITO MASATO·Filed 2012·Application pending·0 cites
- 1139US2011062623A1Method of forming a pattern formation templateSAITO MASATO·Filed 2010·Application pending·0 cites
- 1238US2010237469A1Photomask, semiconductor device, and charged beam writing apparatusSAITO MASATO·Filed 2010·Application pending·0 cites
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