Assignee
RAMIN MANFRED
US·3 granted patents·3 citations·filing 2010–2010
Top patents by PatentIndex Score
3 records- 0169US8304333B2Method of forming a high-k gate dielectric layerRAMIN MANFRED·Filed 2010·Granted Nov 6, 2012·2 cites·11 claims
- 0260US8748246B2Integration scheme for dual work function metal gatesRAMIN MANFRED·Filed 2010·Granted Jun 10, 2014·1 cites·27 claims
- 0348US8409943B2Work function adjustment with the implant of lanthanidesRAMIN MANFRED·Filed 2010·Granted Apr 2, 2013·0 cites·14 claims
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