Assignee
OGASAWARA KOSUKE
JP·3 granted patents·6 citations·filing 2008–2009
Top patents by PatentIndex Score
3 records- 0175US8580077B2Plasma processing apparatus for performing accurate end point detectionOGASAWARA KOSUKE·Filed 2009·Granted Nov 12, 2013·5 cites·22 claims
- 0257US8187980B2Etching method, etching apparatus and storage mediumOGASAWARA KOSUKE·Filed 2008·Granted May 29, 2012·1 cites·5 claims
- 0346US8232207B2Substrate processing methodOGASAWARA KOSUKE·Filed 2009·Granted Jul 31, 2012·0 cites·12 claims
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