Assignee

IONEER LLC

US·1 granted patent·1 pending application·0 citations·filing 2016–2018

Technology mixH01L2 H10P2 B24B1 G05B1 H01J1 H05H1

Top patents by PatentIndex Score

2 records

0132US2020383196A1Method and system for measuring plasma emissions in a plasma processing reactorIONEER LLC·Filed 2018·Application pending·0 cites
0231US11724354B2Apparatus and method for determining parameters of process operationIONEER LLC·Filed 2016·Granted Aug 15, 2023·0 cites·15 claims

Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →